Inventor
MATSUYAMA SHOICHIRO
JP24 patents
⚠️ This page may combine multiple inventors who share the name “MATSUYAMA SHOICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
15 patentsUS7625494B2Dec 1, 2009
Plasma etching method and plasma etching unit
TOKYO ELECTRON LTD35 citations92
US7619870B2Nov 17, 2009
Electrostatic chuck
TOKYO ELECTRON LTD24 citations92
US12046457B2Jul 23, 2024
Electrostatic chuck, focus ring, support base, plasma processing apparatus, and plasma processing method
TOKYO ELECTRON LTD2 citations73
US11830751B2Nov 28, 2023
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD2 citations72
US11728144B2Aug 15, 2023
Edge ring and substrate processing apparatus
TOKYO ELECTRON LTD2 citations72
US11538668B2Dec 27, 2022
Mounting stage, substrate processing device, and edge ring
TOKYO ELECTRON LTD2 citations72
US9390943B2Jul 12, 2016
Substrate processing apparatus
TOKYO ELECTRON LTD4 citations72
US7419613B2Sep 2, 2008
Method and device for plasma-etching organic material film
TOKYO ELECTRON LTD5 citations63
US12394607B2Aug 19, 2025
Attracting method
TOKYO ELECTRON LTD0 citations62
US11004717B2May 11, 2021
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD1 citations62
US11764038B2Sep 19, 2023
Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction program
TOKYO ELECTRON LTD0 citations60
US7767055B2Aug 3, 2010
Capacitive coupling plasma processing apparatus
TOKYO ELECTRON LTD5 citations59
US12125679B2Oct 22, 2024
Plasma processing apparatus and processing method
TOKYO ELECTRON LTD1 citations58
US9230824B2Jan 5, 2016
Method of manufacturing semiconductor device
TOKYO ELECTRON LTD2 citations55
US10879050B2Dec 29, 2020
Plasma processing apparatus, electrostatic attraction method, and electrostatic attraction program
TOKYO ELECTRON LTD0 citations50
OCTEC INC
2 patentsUS7585386B2Sep 8, 2009
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
OCTEC INC33 citations91
US7922862B2Apr 12, 2011
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
OCTEC INC9 citations83