Inventor

VASILYEVA IRINA

US19 patents

⚠️ This page may combine multiple inventors who share the name “VASILYEVA IRINA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VASILYEVA IRINA

MICRON TECHNOLOGY INC

Method for depositing a tungsten layer on silicon

Methods of forming semiconductor structures including multi-portion liners

Methods of forming capacitors

Semiconductor devices and methods for backside photo alignment

Plasma enhanced chemical vapor deposition method of forming a titanium silicide comprising layer

Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers

Plasma enhanced chemical vapor deposition methods of forming titanium silicide comprising layers over a plurality of semiconductor substrates

Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers

Methods of forming semiconductor structures including multi-portion liners

Semiconductor devices and methods for backside photo alignment

Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers

Methods of exposing conductive Vias of semiconductor devices and related semiconductor devices

Methods of forming devices including multi-portion liners

Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers

Chemical vapor deposition method of forming a material over at least two substrates

Devices including multi-portion liners

Semiconductor structures including multi-portion liners

LI HONGQI

Methods of exposing conductive vias of semiconductor devices and associated structures

SHEA KEVIN

Method of forming capacitors