Inventor
NAIINI AHMAD A
US28 patents
⚠️ This page may combine multiple inventors who share the name “NAIINI AHMAD A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM ELECTRONIC MAT USA INC
11 patentsUS11899364B2Feb 13, 2024
Photosensitive polyimide compositions
FUJIFILM ELECTRONIC MAT USA INC1 citations72
US10604628B2Mar 31, 2020
Polymer and thermosetting composition containing same
FUJIFILM ELECTRONIC MAT USA INC2 citations72
US10036952B2Jul 31, 2018
Photosensitive polyimide compositions
FUJIFILM ELECTRONIC MAT USA INC4 citations72
US9695284B2Jul 4, 2017
Polymer and thermosetting composition containing same
FUJIFILM ELECTRONIC MAT USA INC3 citations72
US11782344B2Oct 10, 2023
Photosensitive polyimide compositions
FUJIFILM ELECTRONIC MAT USA INC0 citations62
US11175582B2Nov 16, 2021
Photosensitive stacked structure
FUJIFILM ELECTRONIC MAT USA INC0 citations62
US11721543B2Aug 8, 2023
Planarizing process and composition
FUJIFILM ELECTRONIC MAT USA INC0 citations57
US11939428B2Mar 26, 2024
Polyimides
FUJIFILM ELECTRONIC MAT USA INC0 citations51
US11061327B2Jul 13, 2021
Polyimides
FUJIFILM ELECTRONIC MAT USA INC0 citations51
US10696932B2Jun 30, 2020
Cleaning composition
FUJIFILM ELECTRONIC MAT USA INC0 citations51
US10793676B2Oct 6, 2020
Polyimides
FUJIFILM ELECTRONIC MAT USA INC0 citations41
ARCH SPEC CHEM INC
10 patentsUS6929891B2Aug 16, 2005
Photosensitive resin compositions
ARCH SPEC CHEM INC62 citations95
US7132205B2Nov 7, 2006
Positive photosensitive resin compositions
ARCH SPEC CHEM INC26 citations91
US7129011B2Oct 31, 2006
Photosensitive resin compositions
ARCH SPEC CHEM INC26 citations91
US7056641B2Jun 6, 2006
Photosensitive resin compositions
ARCH SPEC CHEM INC19 citations90
US6939659B2Sep 6, 2005
Photosensitive resin compositions
ARCH SPEC CHEM INC16 citations90
US7101652B2Sep 5, 2006
Photosensitive resin compositions
ARCH SPEC CHEM INC13 citations81
US7335319B2Feb 26, 2008
Semiconductor stress buffer coating edge bead removal compositions and method for their use
ARCH SPEC CHEM INC9 citations78
US7018776B2Mar 28, 2006
Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems
ARCH SPEC CHEM INC7 citations69
US6140026AOct 31, 2000
Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures
ARCH SPEC CHEM INC2 citations62
US7195849B2Mar 27, 2007
Photosensitive resin compositions
ARCH SPEC CHEM INC3 citations60
FUJIFILM ELECTRONIC MATERIALS
5 patentsUS7803510B2Sep 28, 2010
Positive photosensitive polybenzoxazole precursor compositions
FUJIFILM ELECTRONIC MATERIALS27 citations89
US7407731B2Aug 5, 2008
Photosensitive resin compositions
FUJIFILM ELECTRONIC MATERIALS9 citations81
US7220520B2May 22, 2007
Photosensitive resin compositions
FUJIFILM ELECTRONIC MATERIALS8 citations71
US7416830B2Aug 26, 2008
Photosensitive resin compositions
FUJIFILM ELECTRONIC MATERIALS7 citations70
US7399572B2Jul 15, 2008
Pretreatment compositions
FUJIFILM ELECTRONIC MATERIALS2 citations60