Inventor
HUANG FU-MING
TW23 patents
⚠️ This page may combine multiple inventors who share the name “HUANG FU-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
20 patentsUS9630295B2Apr 25, 2017
Mechanisms for removing debris from polishing pad
TAIWAN SEMICONDUCTOR MFG CO LTD25 citations93
US9460997B2Oct 4, 2016
Interconnect structure for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10269555B2Apr 23, 2019
Post-CMP cleaning and apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US9962805B2May 8, 2018
Chemical mechanical polishing apparatus and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11772228B2Oct 3, 2023
Chemical mechanical polishing apparatus including a multi-zone platen
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11679469B2Jun 20, 2023
Chemical mechanical planarization tool
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US12170195B2Dec 17, 2024
Post-CMP cleaning and apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11728157B2Aug 15, 2023
Post-CMP cleaning and apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11450565B2Sep 20, 2022
Ion implant process for defect elimination in metal layer planarization
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11322345B2May 3, 2022
Post-CMP cleaning and apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12297375B2May 13, 2025
Slurry composition and method for polishing and integrated circuit
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12172263B2Dec 24, 2024
Chemical mechanical planarization tool
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12002684B2Jun 4, 2024
Methods for chemical mechanical polishing and forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11658065B2May 23, 2023
Chemical mechanical polishing slurry composition, method for chemical mechanical polishing and method for forming connecting structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11508585B2Nov 22, 2022
Methods for chemical mechanical polishing and forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US10062645B2Aug 28, 2018
Interconnect structure for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9679848B2Jun 13, 2017
Interconnect structure for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9723915B2Aug 8, 2017
Brush cleaning method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9305880B2Apr 5, 2016
Interconnects for semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9370854B2Jun 21, 2016
Method of fabricating a semiconductor device, and chemical mechanical polish tool
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations40