Inventor
GRAEUPNER PAUL
DE24 patents
⚠️ This page may combine multiple inventors who share the name “GRAEUPNER PAUL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
12 patentsUS7227616B2Jun 5, 2007
Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT AG63 citations97
US7209292B2Apr 24, 2007
Projection objective, especially for microlithography, and method for adjusting a projection objective
ZEISS CARL SMT AG56 citations95
US7233386B2Jun 19, 2007
Method of optimizing imaging performance
ZEISS CARL SMT AG16 citations92
US6678240B2Jan 13, 2004
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements
ZEISS CARL SMT AG27 citations90
US7800732B2Sep 21, 2010
Projection exposure method and projection exposure apparatus for microlithography
ZEISS CARL SMT AG9 citations83
US7570345B2Aug 4, 2009
Method of optimizing imaging performance
ZEISS CARL SMT AG7 citations73
US7310187B2Dec 18, 2007
Projection objective, especially for microlithography, and method for adjusting a projection objective
ZEISS CARL SMT AG8 citations73
US7019846B2Mar 28, 2006
Method for determining wavefront aberrations
ZEISS CARL SMT AG8 citations73
US7301622B2Nov 27, 2007
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements
ZEISS CARL SMT AG6 citations71
US6934011B2Aug 23, 2005
Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements
ZEISS CARL SMT AG11 citations71
US7209241B2Apr 24, 2007
Method for determining wavefront aberrations
ZEISS CARL SMT AG2 citations62
US7649702B2Jan 19, 2010
Immersion lithography objective
ZEISS CARL SMT AG0 citations52
ZEISS CARL SMT GMBH
4 patentsUS8027091B2Sep 27, 2011
Method for correcting optical proximity effects
ZEISS CARL SMT GMBH4 citations62
US11366382B2Jun 21, 2022
Method and apparatus for performing an aerial image simulation of a photolithographic mask
ZEISS CARL SMT GMBH1 citations58
US9885958B2Feb 6, 2018
Projection exposure methods and systems
ZEISS CARL SMT GMBH0 citations52
US9690203B2Jun 27, 2017
Method for adjusting an illumination setting
ZEISS CARL SMT GMBH0 citations41
GRAEUPNER PAUL
3 patentsUS8917379B2Dec 23, 2014
Projection exposure methods and systems
GRAEUPNER PAUL1 citations49
US8405907B2Mar 26, 2013
Method for correcting optical proximity effects
GRAEUPNER PAUL0 citations49
US8237915B2Aug 7, 2012
Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
GRAEUPNER PAUL0 citations49