Inventor

ULRICH WILHELM

DE133 patents

⚠️ This page may combine multiple inventors who share the name “ULRICH WILHELM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ULRICH WILHELM

ZEISS CARL SMT AG

Refractive projection objective

Refractive projection objective for immersion lithography

Catoptric objectives and systems using catoptric objectives

Refractive projection objective

Refractive projection objective for immersion lithography

Objective with pupil obscuration

Catoptric objectives and systems using catoptric objectives

8-mirror microlithography projection objective

Reflective projection lens for EUV-photolithography

Projection objective, especially for microlithography, and method for adjusting a projection objective

Objective with fluoride crystal lenses

Catadioptric projection objective with geometric beam splitting

Catadioptric projection objective

Illumination system particularly for microlithography

Catadioptric projection objective with geometric beam splitting

Microlithographic projection exposure apparatus

Reflective projection lens for EUV-photolithography

8-mirror microlithography projection objective

Compact 1½-waist system for sub 100 nm ArF lithography

Projection exposure system

Catadioptric reduction lens

Reflective X-ray microscope and inspection system for examining objects with wavelengths &lt;100 nm

Projection exposure apparatus

Objective with pupil obscuration

Catoptric objectives and systems using catoptric objectives

Catadioptric projection objective

ZEISS STIFTUNG

Microlithographic reduction projection catadioptric objective

Catadioptric objective comprising two intermediate images

Microlithographic reduction projection catadioptric objective

Projection exposure lens with aspheric elements

Catadioptric optical system and exposure apparatus having the same

Catadioptric reduction objective

Optical projection system

Modular infrared kepler telescope

Achromatic and athermalized reimager

Coordinate measuring apparatus having an optical sensing head

Scanner

ZEISS CARL SMT GMBH

Catoptric objectives and systems using catoptric objectives

Microlithographic reduction projection catadioptric objective

Projection objective

Illumination system particularly for microlithography

Reduction projection objective and projection exposure apparatus including the same

ZEISS CARL SEMICONDUCTOR MFG

Projection objective having adjacently mounted aspheric lens surfaces

Projection exposure apparatus for microlithography

ZEISS CARL

Optical projection lens system

DODOC AURELIAN

Catadioptric projection objective with intermediate images

CARL ZEISS SEMICONDUCTOR

Illumination system particularly for microlithography

CARL ZEIS STIFTUNG

Uv-capable dry lens for microscopes

SHAFER DAVID

Catadioptric projection objective

MANN HANS-JUERGEN

Catoptric objectives and systems using catoptric objectives

Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm