Inventor

HARADA RYOSUKE

JP35 patents

⚠️ This page may combine multiple inventors who share the name “HARADA RYOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HARADA RYOSUKE

TANAKA PRECIOUS METAL IND

Chemical deposition raw material including iridium complex and chemical deposition method using the chemical deposition raw material

Chemical vapor deposition raw material containing organic nickel compound, and chemical vapor deposition method using the chemical vapor deposition raw material

Raw material for chemical deposition containing ruthenium complex, and chemical deposition method using the raw material for chemical deposition

Raw material for vapor deposition including organoplatinum compound and vapor deposition method using the raw material for vapor deposition

Heterogeneous polynuclear complex for use in the chemical deposition of composite metal or metal compound thin films

Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method using the raw material for chemical deposition

Chemical deposition raw material formed of ruthenium complex and method for producing the same, and chemical deposition method

Method for producing cyclometalated iridium complex

Organoplatinum compound for use in the chemical deposition of platinum compound thin films

Raw material for chemical deposition composed of organoplatinum compound, and chemical deposition method using the raw material for chemical deposition

Chemical vapor deposition method using an organomanganese compound as a starting material

Method for extracting asymmetric β-diketone compound from β-diketone compound

Method for manufacturing iridium complex

Raw material and production method for cyclometalated iridium complex

Method for recycling organic ruthenium compound for chemical vapor deposition

Raw material for chemical deposition including organoruthenium compound, and chemical deposition method using the raw material for chemical deposition

Chemical deposition raw material including heterogeneous polynuclear complex and chemical deposition method using the chemical deposition raw material

Method for producing nickel thin film on a Si substrate by chemical vapor deposition method, and method for producing Ni silicide thin film on Si substrate

Chemical vapor deposition raw material including dinuclear ruthenium complex and chemical deposition method using chemical vapor deposition raw material

SEKISUI PLASTICS

Vinyl-based resin particles and method for producing same

Silica-including microcapsule resin particles, method for producing same, and application thereof

Silica-including microcapsule resin particles, method for producing same, and application thereof

Spacer particle for resin composition layer and use thereof

Polyester-based resin particles, process for producing same, and use thereof

High-recoverability resin particles of a crosslinked (meth)acrylic acid ester-based resin, and use thereof

SEKISUI KASEI CO LTD

Spherical polyester resin particles and method for producing same

Fluorescent resin particles and use thereof

Metal-coated non-spherical resin particles and method for producing same, aligned film of metal-coated non-spherical resin particles and method for producing same, particles, and method for producing particle-aligned film

HARADA RYOSUKE

Deformed shaped particles and method for producing the same

Non-spherical resin particles, manufacturing method thereof, and use thereof

SUMITOMO RUBBER IND

Composite and pneumatic tire

Composite and pneumatic tire

NAKAMURA MASAAKI

Non-spherical resin particles, manufacturing method thereof, and use thereof

Resin particles and process for producing same, antiglare film, light-diffusing resin composition, and external preparation

ISHIMORI FUMITAKA

Porous resin particles, method for manufacturing the same, dispersion liquid, and use thereof