Inventor
OSHIMO KENTARO
JP15 patents
⚠️ This page may combine multiple inventors who share the name “OSHIMO KENTARO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
14 patentsUS6454909B1Sep 24, 2002
Method and apparatus for forming a film on an object to be processed
TOKYO ELECTRON LTD351 citations98
US9136133B2Sep 15, 2015
Method of depositing film
TOKYO ELECTRON LTD12 citations82
US9777369B2Oct 3, 2017
Method of depositing a film, recording medium, and film deposition apparatus
TOKYO ELECTRON LTD2 citations73
US9714467B2Jul 25, 2017
Method for processing a substrate and substrate processing apparatus
TOKYO ELECTRON LTD5 citations72
US10438791B2Oct 8, 2019
Film forming method, film forming apparatus, and storage medium
TOKYO ELECTRON LTD2 citations71
US11414753B2Aug 16, 2022
Processing method
TOKYO ELECTRON LTD0 citations62
US7615251B2Nov 10, 2009
Processing device using shower head structure and processing method
TOKYO ELECTRON LTD3 citations62
US10900121B2Jan 26, 2021
Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations61
US11201053B2Dec 14, 2021
Film forming method and film forming apparatus
TOKYO ELECTRON LTD1 citations60
US10714332B2Jul 14, 2020
Film forming method and film forming apparatus
TOKYO ELECTRON LTD1 citations60
US10151031B2Dec 11, 2018
Method for processing a substrate and substrate processing apparatus
TOKYO ELECTRON LTD1 citations51
US11171014B2Nov 9, 2021
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations50
US8921237B2Dec 30, 2014
Method of depositing a film
TOKYO ELECTRON LTD0 citations50
US10550470B2Feb 4, 2020
Film forming apparatus and operation method of film forming apparatus
TOKYO ELECTRON LTD0 citations40