Inventor

LIN CHENG-MING

TW73 patents

⚠️ This page may combine multiple inventors who share the name “LIN CHENG-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN CHENG-MING

TAIWAN SEMICONDUCTOR MFG CO LTD

Semiconductor device and fabrication method thereof

Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask

Semiconductor device and fabrication method thereof

Selective internal gate structure for ferroelectric semiconductor devices

Selective internal gate structure for ferroelectric semiconductor devices

Semiconductor device and fabrication method thereof

Structure and method of reticle pod having inspection window

Mask defect prevention

Structure and method of reticle pod having inspection window

Method and system for processing substrate by chemical solution in semiconductor manufacturing fabrication

Fabrication of field effect transistors with ferroelectric materials

Semiconductor device having isolation structure formed of low-k dielectric material and method for forming the same

Selective internal gate structure for ferroelectric semiconductor devices

Gate stack treatment for ferroelectric transistors

Ferroelectric structure for semiconductor devices

Gate stack treatment for ferroelectric transistors

Device performance by fluorine treatment

Self-aligned metal compound layers for semiconductor devices

Ferroelectric structure for semiconductor devices

Fabrication of field effect transistors with ferroelectric materials

Gate stack treatment for ferroelectric transistors

FinFET having a work function material gradient

Radical treatment in supercritical fluid for gate dielectric quality improvement to CFET structure

Semiconductor device, and method for protecting low-k dielectric feature of semiconductor device

Fabricating method of photomask, photomask structure thereof, and semiconductor manufacturing method using the same

Semiconductor device and fabrication method thereof

Fabricating method of photomask, photomask structure thereof, and semiconductor manufacturing method using the same

Field effect transistors with ferroelectric dielectric materials

FinFET having a work function material gradient

Fabricating method of photomask, photomask structure thereof, and semiconductor manufacturing method using the same

Semiconductor device with germanium-based channel

Contact structures in semiconductor devices

Structure and method of reticle pod having inspection window

Graphene layer for low resistance contacts and damascene interconnects

Method for cleaning substrate, method for manufacturing photomask and method for cleaning photomask

Mask defect prevention

Method for forming semiconductor device

Mask defect prevention

TAIWAN SEMICONDUCTOR MFG

Method and system for reducing critical dimension side-to-side tilting error

Single trench repair method with etched quartz for attenuated phase shifting mask

Embedded bi-layer structure for attenuated phase shifting mask

Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography

Multiple stepped aperture repair of transparent photomask substrates

Multiple exposure method for forming a patterned photoresist layer

AlSixOy as a new bi-layer high transmittance attenuating phase shifting mask material for 193 nanometer lithography

AIDMICS BIOTECHNOLOGY CO LTD

Portable microscope device

Sample carrying module and portable microscope using the same

Reflecting microscope module and reflecting microscope device

LIN CHENG-MING

Mask and blank storage inner gas

HEWLETT PACKARD DEVELOPMENT CO

Rotatable antennas