Inventor
KIM SEOK-HOON
KR62 patents
⚠️ This page may combine multiple inventors who share the name “KIM SEOK-HOON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
43 patentsUS9153692B2Oct 6, 2015
Semiconductor device having a stress film on a side surface of a fin
SAMSUNG ELECTRONICS CO LTD40 citations93
US11145720B2Oct 12, 2021
Semiconductor device
SAMSUNG ELECTRONICS CO LTD5 citations84
US10388791B2Aug 20, 2019
Semiconductor device with adjacent source/drain regions connected by a semiconductor bridge, and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD8 citations84
US10672764B2Jun 2, 2020
Integrated circuit semiconductor devices including a metal oxide semiconductor (MOS) transistor
SAMSUNG ELECTRONICS CO LTD8 citations83
US10211322B1Feb 19, 2019
Semiconductor device including channel pattern and manufacturing method thereof
SAMSUNG ELECTRONICS CO LTD12 citations83
US10714387B2Jul 14, 2020
Integrated circuit devices and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD9 citations82
US9905036B2Feb 27, 2018
Graphics processing unit for adjusting level-of-detail, method of operating the same, and devices including the same
SAMSUNG ELECTRONICS CO LTD8 citations76
US10084049B2Sep 25, 2018
Semiconductor device
SAMSUNG ELECTRONICS CO LTD4 citations73
US9735158B2Aug 15, 2017
Semiconductor devices having bridge layer and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD2 citations73
US9275995B2Mar 1, 2016
Semiconductor devices having composite spacers containing different dielectric materials
SAMSUNG ELECTRONICS CO LTD6 citations73
US9240461B2Jan 19, 2016
Method for fabricating semiconductor device
SAMSUNG ELECTRONICS CO LTD4 citations73
US11728434B2Aug 15, 2023
Semiconductor device
SAMSUNG ELECTRONICS CO LTD2 citations72
US10784379B2Sep 22, 2020
Semiconductor device including a shared semiconductor pattern having faceted sidewalls and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD2 citations72
US9779547B2Oct 3, 2017
Tessellation method for assigning a tessellation factor per point and device performing the method
SAMSUNG ELECTRONICS CO LTD2 citations72
US9916251B2Mar 13, 2018
Display driving apparatus and cache managing method thereof
SAMSUNG ELECTRONICS CO LTD2 citations64
US12362204B2Jul 15, 2025
Method of manufacturing semiconductor device using stationary laser module
SAMSUNG ELECTRONICS CO LTD0 citations62
US12042828B2Jul 23, 2024
Wafer cleaning apparatus and wafer cleaning method using the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11742221B2Aug 29, 2023
Dry cleaning apparatus and dry cleaning method
SAMSUNG ELECTRONICS CO LTD0 citations62
US11735631B2Aug 22, 2023
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations62
US11648594B2May 16, 2023
Wafer cleaning apparatus and wafer cleaning method using the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11631599B2Apr 18, 2023
Semiconductor device manufacturing apparatus including laser module
SAMSUNG ELECTRONICS CO LTD0 citations62
US11605545B2Mar 14, 2023
Wafer cleaning equipment
SAMSUNG ELECTRONICS CO LTD1 citations62
US11087996B2Aug 10, 2021
Dry cleaning apparatus and dry cleaning method
SAMSUNG ELECTRONICS CO LTD0 citations62
US10727348B2Jul 28, 2020
Semiconductor device with adjacent source/drain regions connected by a semiconductor bridge, and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD1 citations62
US12142690B2Nov 12, 2024
Semiconductor devices
SAMSUNG ELECTRONICS CO LTD0 citations61
US12027586B2Jul 2, 2024
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations61
US11942551B2Mar 26, 2024
Semiconductor devices
SAMSUNG ELECTRONICS CO LTD0 citations61
US11508751B2Nov 22, 2022
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations61
US10930668B2Feb 23, 2021
Semiconductor device
SAMSUNG ELECTRONICS CO LTD1 citations61
US12289908B2Apr 29, 2025
Semiconductor device having multi-bridge channel field-effect transistor including source/drain pattern with a plurality of semiconductor patterns
SAMSUNG ELECTRONICS CO LTD0 citations60
US12021131B2Jun 25, 2024
Semiconductor device
SAMSUNG ELECTRONICS CO LTD1 citations60
US11551972B2Jan 10, 2023
Integrated circuit devices and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations60
US10950499B2Mar 16, 2021
Integrated circuit devices and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations60
US10395951B2Aug 27, 2019
Method of cleaning a substrate and apparatus for performing the same
SAMSUNG ELECTRONICS CO LTD1 citations58
US12550361B2Feb 10, 2026
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations52
US12100602B2Sep 24, 2024
Wet etching apparatus
SAMSUNG ELECTRONICS CO LTD0 citations52
US12040402B2Jul 16, 2024
Semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations52
US10147723B2Dec 4, 2018
Semiconductor devices having bridge layer and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US10140677B2Nov 27, 2018
Graphics processing unit and device employing tessellation decision
SAMSUNG ELECTRONICS CO LTD1 citations52
US9755076B2Sep 5, 2017
Semiconductor devices having source/drain regions with strain-inducing layers and methods of manufacturing such semiconductor devices
SAMSUNG ELECTRONICS CO LTD0 citations52
US9582935B2Feb 28, 2017
Tessellation device including cache, method thereof, and system including the tessellation device
SAMSUNG ELECTRONICS CO LTD0 citations52
US9553192B2Jan 24, 2017
Semiconductor devices having source/drain regions with strain-inducing layers and methods of manufacturing such semiconductor devices
SAMSUNG ELECTRONICS CO LTD0 citations52
US9552618B2Jan 24, 2017
Method for domain shading, and devices operating the same
SAMSUNG ELECTRONICS CO LTD0 citations52
KIM SEOK-HOON
5 patentsUS9595611B2Mar 14, 2017
FinFET with a single contact to multiple fins bridged together to form a source/drain region of the transistor
KIM SEOK-HOON21 citations93
US8101480B1Jan 24, 2012
Methods of forming transistors and CMOS semiconductor devices using an SMT technique
KIM SEOK-HOON34 citations91
US9397219B2Jul 19, 2016
Semiconductor devices having source/drain regions with strain-inducing layers and methods of manufacturing such semiconductor devices
KIM SEOK-HOON8 citations83
US9368495B2Jun 14, 2016
Semiconductor devices having bridge layer and methods of manufacturing the same
KIM SEOK-HOON6 citations83
US8772095B2Jul 8, 2014
Method of manufacturing semiconductor device using stress memorization technique
KIM SEOK-HOON5 citations71
KIM JIN BUM
1 patentJEE JUNG-GEUN
1 patentShowing the top 50 of 62 patents by PatentIndex Score.