Inventor
DOLE NIKHIL
US12 patents
Patents
12 patentsUS10504744B1Dec 10, 2019
Three or more states for achieving high aspect ratio dielectric etch
LAM RES CORP25 citations93
US9543158B2Jan 10, 2017
Technique to deposit sidewall passivation for high aspect ratio cylinder etch
LAM RES CORP28 citations93
US10170324B2Jan 1, 2019
Technique to tune sidewall passivation deposition conformality for high aspect ratio cylinder etch
LAM RES CORP13 citations84
US10297459B2May 21, 2019
Technique to deposit sidewall passivation for high aspect ratio cylinder etch
LAM RES CORP7 citations83
US10741407B2Aug 11, 2020
Reduction of sidewall notching for high aspect ratio 3D NAND etch
LAM RES CORP8 citations78
US10861708B2Dec 8, 2020
Three or more states for achieving high aspect ratio dielectric etch
LAM RES CORP4 citations72
US10847377B2Nov 24, 2020
Method of achieving high selectivity for high aspect ratio dielectric etch
LAM RES CORP2 citations71
US10515821B1Dec 24, 2019
Method of achieving high selectivity for high aspect ratio dielectric etch
LAM RES CORP3 citations71
US12217972B2Feb 4, 2025
Multi-state pulsing for achieving a balance between bow control and mask selectivity
LAM RES CORP3 citations69
US12278112B2Apr 15, 2025
Multiple state pulsing for high aspect ratio etch
LAM RES CORP1 citations59
US12020944B2Jun 25, 2024
Method for etching an etch layer
LAM RES CORP0 citations50
US12322571B2Jun 3, 2025
Multi-state RF pulsing to control mask shape and breaking selectivity versus process margin trade-off
LAM RES CORP0 citations40