Inventor
FRASS HANS W
DE7 patents
Patents
7 patentsUS5227281AJul 13, 1993
Process for producing negative copies
HOECHST AG30 citations92
US5376496ADec 27, 1994
Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder
HOECHST AG16 citations73
US5292626AMar 8, 1994
Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers
HOECHST AG13 citations73
US4889788ADec 26, 1989
Photosensitive composition, photosensitive copying material prepared from this composition with thermal hardening symmetric triazine alkyl(aryl)-ether
HOECHST AG14 citations72
US5378584AJan 3, 1995
Radiation-sensitive recording material with a positive-working, radiation-sensitive layer having a rough surface containing a surfactant having polysiloxane units
HOECHST AG10 citations68
US4990429AFeb 5, 1991
Process for the production of negative relief copies utilizing reversal processing
HOECHST AG3 citations61
US5368975ANov 29, 1994
Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility
HOECHST AG5 citations59