Inventor
YOKOI SHIGERU
JP20 patents
⚠️ This page may combine multiple inventors who share the name “YOKOI SHIGERU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
7 patentsUS7442675B2Oct 28, 2008
Cleaning composition and method of cleaning semiconductor substrate
TOKYO OHKA KOGYO CO LTD12 citations82
US6416930B2Jul 9, 2002
Composition for lithographic anti-reflection coating, and resist laminate using the same
TOKYO OHKA KOGYO CO LTD4 citations63
US9352542B2May 31, 2016
Processing method and processing apparatus
TOKYO OHKA KOGYO CO LTD2 citations57
US6746963B2Jun 8, 2004
Method for processing coating film and method for manufacturing semiconductor element with use of the same method
TOKYO OHKA KOGYO CO LTD0 citations52
US8354215B2Jan 15, 2013
Method for stripping photoresist
TOKYO OHKA KOGYO CO LTD1 citations51
US7129020B2Oct 31, 2006
Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern
TOKYO OHKA KOGYO CO LTD1 citations51
US8354365B2Jan 15, 2013
Cleaning liquid for lithography and method for forming wiring
TOKYO OHKA KOGYO CO LTD0 citations38
YOKOI SHIGERU
5 patentsUS8192923B2Jun 5, 2012
Photoresist stripping solution and a method of stripping photoresists using the same
YOKOI SHIGERU3 citations61
US8685910B2Apr 1, 2014
Cleaning liquid used in photolithography and a method for treating substrate therewith
YOKOI SHIGERU1 citations51
US8158568B2Apr 17, 2012
Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith
YOKOI SHIGERU1 citations51
US8803026B2Aug 12, 2014
Laser machining device and bellows device
YOKOI SHIGERU1 citations50
US8114825B2Feb 14, 2012
Photoresist stripping solution
YOKOI SHIGERU1 citations48