Inventor
DEBOER SCOTT
US17 patents
Patents
17 patentsUS6436818B1Aug 20, 2002
Semiconductor structure having a doped conductive layer
MICRON TECHNOLOGY INC114 citations98
US6204143B1Mar 20, 2001
Method of forming high aspect ratio structures for semiconductor devices
MICRON TECHNOLOGY INC130 citations98
US6015997AJan 18, 2000
Semiconductor structure having a doped conductive layer
MICRON TECHNOLOGY INC87 citations98
US6281543B1Aug 28, 2001
Double layer electrode and barrier system on hemispherical grain silicon for use with high dielectric constant materials and methods for fabricating the same
MICRON TECHNOLOGY INC47 citations96
US6291364B1Sep 18, 2001
Method and apparatus for stabilizing high pressure oxidation of a semiconductor device
MICRON TECHNOLOGY INC18 citations92
US5926730AJul 20, 1999
Conductor layer nitridation
MICRON TECHNOLOGY INC30 citations92
US6423649B2Jul 23, 2002
Method and apparatus for stabilizing high pressure oxidation of a semiconductor device
MICRON TECHNOLOGY INC17 citations91
US6596651B2Jul 22, 2003
Method for stabilizing high pressure oxidation of a semiconductor device
MICRON TECHNOLOGY INC11 citations81
US6887774B2May 3, 2005
Conductor layer nitridation
MICRON TECHNOLOGY INC8 citations74
US6798026B2Sep 28, 2004
Conductor layer nitridation
MICRON TECHNOLOGY INC10 citations74
US6673689B2Jan 6, 2004
Double layer electrode and barrier system on hemispherical grain silicon for use with high dielectric constant materials and methods for fabricating the same
MICRON TECHNOLOGY INC12 citations74
US6525384B2Feb 25, 2003
Conductor layer nitridation
MICRON TECHNOLOGY INC7 citations74
US6399459B2Jun 4, 2002
Double layer electrode and barrier system on hemispherical grain silicon for use with high dielectric constant materials and methods for fabricating the same
MICRON TECHNOLOGY INC4 citations74
US7410911B2Aug 12, 2008
Method for stabilizing high pressure oxidation of a semiconductor device
MICRON TECHNOLOGY INC0 citations51
US7282457B2Oct 16, 2007
Apparatus for stabilizing high pressure oxidation of a semiconductor device
MICRON TECHNOLOGY INC0 citations51
US7279435B2Oct 9, 2007
Apparatus for stabilizing high pressure oxidation of a semiconductor device
MICRON TECHNOLOGY INC0 citations51
US6955996B2Oct 18, 2005
Method for stabilizing high pressure oxidation of a semiconductor device
MICRON TECHNOLOGY INC0 citations50