Inventor
WANAT STANLEY F
US23 patents
⚠️ This page may combine multiple inventors who share the name “WANAT STANLEY F”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST CELANESE CORP
9 patentsUS4999266AMar 12, 1991
Protected color image on substrate with thermal adhesive and antiblocking overlayers
HOECHST CELANESE CORP52 citations90
US4719169AJan 12, 1988
Protective coating for images
HOECHST CELANESE CORP39 citations90
US5432046AJul 11, 1995
Process for preparing improved lithographic printing plates by brushgraining with alumina/quartz slurry
HOECHST CELANESE CORP25 citations87
US5200291AApr 6, 1993
Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
HOECHST CELANESE CORP9 citations74
US4935331AJun 19, 1990
Pigment transfer to photopolymerizable positive-working imaging system
HOECHST CELANESE CORP13 citations74
US4914039AApr 3, 1990
Water developable, negative working overlay or transfer type diazo color proofing system
HOECHST CELANESE CORP6 citations74
US5429903AJul 4, 1995
Water developable, negative working overlay or transfer type diazo color proofing film
HOECHST CELANESE CORP2 citations63
US5348834ASep 20, 1994
Water developable, negative working overlay color proofing system utilizing water soluble polymeric diazonium compound; water insoluble, water swellable binder resin; and a colorant
HOECHST CELANESE CORP2 citations63
US5212041AMay 18, 1993
Water developable, negative working overlay color proofing system utilizing water soluble polymeric diazonium compound and water insoluble, water swellable, binder resin
HOECHST CELANESE CORP2 citations63
HOECHST CO AMERICAN
6 patentsUS4383897AMay 17, 1983
Electrochemically treated metal plates
HOECHST CO AMERICAN60 citations96
US4452674AJun 5, 1984
Electrolytes for electrochemically treated metal plates
HOECHST CO AMERICAN43 citations92
US4448647AMay 15, 1984
Electrochemically treated metal plates
HOECHST CO AMERICAN44 citations92
US4399021AAug 16, 1983
Novel electrolytes for electrochemically treated metal plates
HOECHST CO AMERICAN40 citations92
US4374920AFeb 22, 1983
Positive developer containing non-ionic surfactants
HOECHST CO AMERICAN48 citations92
US4157918AJun 12, 1979
Light sensitive film composition
HOECHST CO AMERICAN13 citations73
CLARIANT FINANCE BVI LTD
6 patentsUS6121412ASep 19, 2000
Preparation of fractionated novolak resins by a novel extraction technique
CLARIANT FINANCE BVI LTD14 citations73
US5853947ADec 29, 1998
Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate
CLARIANT FINANCE BVI LTD7 citations73
US6911293B2Jun 28, 2005
Photoresist compositions comprising acetals and ketals as solvents
CLARIANT FINANCE BVI LTD10 citations72
US5928836AJul 27, 1999
Fractionated novolak resin copolymer and photoresist composition therefrom
CLARIANT FINANCE BVI LTD11 citations69
US6297352B1Oct 2, 2001
Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge
CLARIANT FINANCE BVI LTD2 citations63
US6512087B1Jan 28, 2003
Fractionation of resins using a static mixer and a liquid-liquid centrifuge
CLARIANT FINANCE BVI LTD1 citations51