Inventor

ENDRES MARTIN

DE46 patents

⚠️ This page may combine multiple inventors who share the name “ENDRES MARTIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ENDRES MARTIN

ZEISS CARL SMT GMBH

Pupil facet mirror, optical system and illumination optics for a projection lithography system

Illumination optical unit for EUV projection lithography

Illumination optical unit for EUV projection lithography

Illumination optical unit for projection lithography

EUV collector

Illumination optical unit

Facet mirror for use in a projection exposure apparatus for microlithography

Mirror array

Mirror

Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror

Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus

Micromirror array

Illumination optical unit for projection lithography

Illumination optical unit

Reflecting coating with optimized thickness

Projection objective for microlithography

Illumination optical system for projection lithography

Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography

Illumination optical assembly for projection lithography

Illumination system and illumination optical unit for EUV projection lithography

Illumination optical assembly for projection lithography

Illumination optical assembly for a projection exposure apparatus

Illumination system for EUV lithography

Method for illuminating an object field of a projection exposure system

BAYERISCHE MOTOREN WERKE AG

Apparatus and method for connecting two components by means of at least one ball

Component assembly

Device and method for gripping an object

Apparatus for supporting at least one component

ENDRES MARTIN

Illumination optics for microlithography

Illumination optical unit for EUV microlithography

Illumination optical system and optical systems for microlithography

EUV illumination system

OSSMANN JENS

Catoptric illumination system for microlithography tool

Illumination optical system for microlithography

Catoptric illumination system for microlithography tool

DINGER UDO

Facet mirror for use in a projection exposure apparatus for microlithography

FIOLKA DAMIAN

Illumination optics for EUV microlithography and related system and apparatus

ZELLNER JOHANNES

Projection objective for microlithography

STUETZLE RALF

Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus

STAICU ADRIAN

Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography

ZEISS CARL SMT AG

EUV illumination system

KIRCH MARC

Optical element having a plurality of reflective facet elements

MANN HANS-JUERGEN

Imaging optical system and illumination optical system

LAYH MICHAEL

Illumination system for EUV microlithography

ENKISCH HARTMUT

Method for producing a multilayer coating, optical element and optical arrangement

ASML NETHERLANDS BV

Illumination intensity correction device for specifying an illumination intensity over an illumination field of a lithographic projection exposure apparatus