Inventor
HEWETT JOYCE S OEY
US18 patents
Patents
18 patentsUS7103439B1Sep 5, 2006
Method and apparatus for initializing tool controllers based on tool event data
ADVANCED MICRO DEVICES INC19 citations92
US6699727B1Mar 2, 2004
Method for prioritizing production lots based on grade estimates and output requirements
ADVANCED MICRO DEVICES INC21 citations92
US6534328B1Mar 18, 2003
Method of modeling and controlling the endpoint of chemical mechanical polishing operations performed on a process layer, and system for accomplishing same
ADVANCED MICRO DEVICES INC22 citations92
US6365422B1Apr 2, 2002
Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same
ADVANCED MICRO DEVICES INC25 citations92
US6595830B1Jul 22, 2003
Method of controlling chemical mechanical polishing operations to control erosion of insulating materials
ADVANCED MICRO DEVICES INC26 citations91
US6937914B1Aug 30, 2005
Method and apparatus for controlling process target values based on manufacturing metrics
ADVANCED MICRO DEVICES INC16 citations84
US6801817B1Oct 5, 2004
Method and apparatus for integrating multiple process controllers
ADVANCED MICRO DEVICES INC14 citations84
US6588007B1Jul 1, 2003
Use of endpoint system to match individual processing stations within a tool
ADVANCED MICRO DEVICES INC16 citations84
US6746958B1Jun 8, 2004
Method of controlling the duration of an endpoint polishing process in a multistage polishing process
ADVANCED MICRO DEVICES INC19 citations82
US7334202B1Feb 19, 2008
Optimizing critical dimension uniformity utilizing a resist bake plate simulator
ADVANCED MICRO DEVICES INC18 citations80
US6970757B1Nov 29, 2005
Method and apparatus for updating control state variables of a process control model based on rework data
ADVANCED MICRO DEVICES INC10 citations74
US6901340B1May 31, 2005
Method and apparatus for distinguishing between sources of process variation
ADVANCED MICRO DEVICES INC11 citations74
US6632692B1Oct 14, 2003
Automated method of controlling critical dimensions of features by controlling stepper exposure dose, and system for accomplishing same
ADVANCED MICRO DEVICES INC9 citations74
US6576385B2Jun 10, 2003
Method of varying stepper exposure dose to compensate for across-wafer variations in photoresist thickness
ADVANCED MICRO DEVICES INC11 citations74
US6664013B1Dec 16, 2003
Methods of characterizing device performance based upon the duration of an endpointed photoresist develop process, and system for accomplishing same
ADVANCED MICRO DEVICES INC3 citations63
US6569692B1May 27, 2003
Automated method of controlling photoresist develop time to control critical dimensions, and system for accomplishing same
ADVANCED MICRO DEVICES INC5 citations63
US7120514B1Oct 10, 2006
Method and apparatus for performing field-to-field compensation
ADVANCED MICRO DEVICES INC0 citations52
US6784001B2Aug 31, 2004
Automated variation of stepper exposure dose based upon across wafer variations in device characteristics, and system for accomplishing same
ADVANCED MICRO DEVICES INC0 citations52