Inventor
YAMADA KINJI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “YAMADA KINJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
28 patentsUS6576393B1Jun 10, 2003
Composition for resist underlayer film and method for producing the same
JSR CORP75 citations96
US6465368B2Oct 15, 2002
Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film
JSR CORP59 citations95
US6011123AJan 4, 2000
Curable resin composition and cured products
JSR CORP61 citations95
US6800330B2Oct 5, 2004
Composition for film formation, method of film formation, and silica-based film
JSR CORP43 citations92
US6503633B2Jan 7, 2003
Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film
JSR CORP22 citations92
US6472079B2Oct 29, 2002
Composition for film formation, method of film formation, and silica-based film
JSR CORP40 citations92
US6406794B1Jun 18, 2002
Film-forming composition
JSR CORP32 citations92
US6051665AApr 18, 2000
Coating composition
JSR CORP33 citations92
US6410150B1Jun 25, 2002
Composition for film formation, method of film formation, and insulating film
JSR CORP28 citations91
US6410151B1Jun 25, 2002
Composition for film formation, method of film formation, and insulating film
JSR CORP30 citations91
US6313233B1Nov 6, 2001
Curable resin composition cured products
JSR CORP35 citations91
US5905109AMay 18, 1999
Water-type dispersion composition
JSR CORP58 citations91
US6235101B1May 22, 2001
Composition for film formation and film
JSR CORP20 citations90
US6376634B1Apr 23, 2002
Composition for film formation and material for insulating film formation
JSR CORP51 citations89
US7128976B2Oct 31, 2006
Composition for film formation, method of film formation, and silica-based film
JSR CORP20 citations83
US6890605B2May 10, 2005
Method of film formation, insulating film, and substrate for semiconductor
JSR CORP19 citations83
US6468589B2Oct 22, 2002
Composition for film formation and insulating film
JSR CORP10 citations74
US6824833B2Nov 30, 2004
Stacked film, insulating film and substrate for semiconductor
JSR CORP12 citations73
US7569622B2Aug 4, 2009
Biological substance related article and method of manufacturing the same, and biological substance adsorption preventive coating composition and method of using the same
JSR CORP2 citations63
US7153767B2Dec 26, 2006
Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing
JSR CORP3 citations63
US6787193B2Sep 7, 2004
Method for the formation of silica film, silica film, insulating film, and semiconductor device
JSR CORP3 citations63
US6528605B1Mar 4, 2003
Diyne-containing (co)polymer, processes for producing the same, and cured film
JSR CORP6 citations62
US6852370B2Feb 8, 2005
Composition for film formation and material for insulating film formation
JSR CORP2 citations60
US6884862B2Apr 26, 2005
Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film
JSR CORP2 citations57
US6642352B2Nov 4, 2003
Method of manufacturing material for forming insulating film
JSR CORP6 citations57
US7754806B2Jul 13, 2010
Biological substance related article and method of manufacturing the same, and biological substance adsorption preventive coating composition and method of using the same
JSR CORP0 citations52
US9447232B2Sep 20, 2016
Carrier polymer particle, process for producing the same, magnetic particle for specific trapping, and process for producing the same
JSR CORP0 citations51
US6749944B2Jun 15, 2004
Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor
JSR CORP0 citations41