Inventor
OKABE TSUNEYUKI
JP38 patents
⚠️ This page may combine multiple inventors who share the name “OKABE TSUNEYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
21 patentsUS6382238B2May 7, 2002
Fluid control apparatus
TOKYO ELECTRON LTD39 citations92
US6814572B2Nov 9, 2004
Heat treating method and heat treating device
TOKYO ELECTRON LTD17 citations84
US7883076B2Feb 8, 2011
Semiconductor processing system and vaporizer
TOKYO ELECTRON LTD15 citations83
US7547003B2Jun 16, 2009
Vaporizing apparatus and semiconductor processing system
TOKYO ELECTRON LTD14 citations83
US7452424B2Nov 18, 2008
Vaporizer
TOKYO ELECTRON LTD14 citations83
US10287682B2May 14, 2019
Substrate processing apparatus, gas supply method, substrate processing method, and film forming method
TOKYO ELECTRON LTD2 citations72
US8382903B2Feb 26, 2013
Vaporizer and semiconductor processing system
TOKYO ELECTRON LTD5 citations71
US7510884B2Mar 31, 2009
Semiconductor production system and semiconductor production process
TOKYO ELECTRON LTD7 citations71
US12571096B2Mar 10, 2026
Raw material gas supply system and raw material gas supply method
TOKYO ELECTRON LTD1 citations63
US7954452B2Jun 7, 2011
Film formation apparatus for semiconductor process and method for using the same
TOKYO ELECTRON LTD4 citations63
US11965242B2Apr 23, 2024
Raw material supply apparatus and raw material supply method
TOKYO ELECTRON LTD0 citations62
US7682843B2Mar 23, 2010
Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication system
TOKYO ELECTRON LTD5 citations62
US8893743B2Nov 25, 2014
Flow rate controller and processing apparatus
TOKYO ELECTRON LTD2 citations56
US12529138B2Jan 20, 2026
Substrate processing apparatus, raw material cartridge, substrate processing method, and raw material cartridge manufacturing method
TOKYO ELECTRON LTD0 citations52
US11208721B2Dec 28, 2021
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations52
US9371946B2Jun 21, 2016
Pipe joint
TOKYO ELECTRON LTD0 citations52
US12503763B2Dec 23, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations51
US12365985B2Jul 22, 2025
Deposition apparatus with pressure sensor and shower head on same plane and deposition method
TOKYO ELECTRON LTD0 citations49
US10429263B2Oct 1, 2019
Pressure measuring device and exhaust system using the same, and substrate processing apparatus
TOKYO ELECTRON LTD0 citations49
US9159548B2Oct 13, 2015
Semiconductor processing system including vaporizer and method for using same
TOKYO ELECTRON LTD1 citations48
US10669632B2Jun 2, 2020
Processing apparatus
TOKYO ELECTRON LTD0 citations42
CKD CORP
4 patentsUS7726333B2Jun 1, 2010
Fluid controller
CKD CORP50 citations93
US7343926B2Mar 18, 2008
Liquid raw material supply unit for vaporizer
CKD CORP10 citations84
US8371334B2Feb 12, 2013
Rotary switching valve
CKD CORP7 citations83
US7874316B2Jan 25, 2011
Purge gas unit and purge gas supply integrated unit
CKD CORP7 citations79
FUJIKIN KK
4 patentsUS11255468B2Feb 22, 2022
Gasket for fluid coupling, and fluid coupling
FUJIKIN KK3 citations73
US11402124B2Aug 2, 2022
Fluid heater, fluid control apparatus, and production method for fluid heater
FUJIKIN KK2 citations71
US11774015B2Oct 3, 2023
Pipe joint
FUJIKIN KK0 citations61
US10753497B2Aug 25, 2020
Shutoff-opening device
FUJIKIN KK0 citations40
OKABE TSUNEYUKI
3 patentsUS8944095B2Feb 3, 2015
Gas supply apparatus for semiconductor manufacturing apparatus
OKABE TSUNEYUKI22 citations91
US8851106B2Oct 7, 2014
Gas supplying apparatus, cylinder cabinet provided with the same, valve box, and substrate process apparatus
OKABE TSUNEYUKI7 citations82
US9435470B2Sep 6, 2016
Pipe joint
OKABE TSUNEYUKI3 citations72