Inventor
KO YONGSUN
KR26 patents
⚠️ This page may combine multiple inventors who share the name “KO YONGSUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
20 patentsUS10361100B2Jul 23, 2019
Apparatus and methods for treating a substrate
SAMSUNG ELECTRONICS CO LTD7 citations83
US9368647B2Jun 14, 2016
Compositions for etching
SAMSUNG ELECTRONICS CO LTD15 citations82
US10580617B2Mar 3, 2020
Method and apparatus for plasma etching
SAMSUNG ELECTRONICS CO LTD2 citations72
US9941110B2Apr 10, 2018
Manufacturing method and fluid supply system for treating substrate
SAMSUNG ELECTRONICS CO LTD3 citations72
US9627233B2Apr 18, 2017
Substrate treating apparatus
SAMSUNG ELECTRONICS CO LTD4 citations72
US9595434B2Mar 14, 2017
Apparatus and methods for manufacturing semiconductor devices and treating substrates
SAMSUNG ELECTRONICS CO LTD6 citations72
US9524864B2Dec 20, 2016
Manufacturing method and fluid supply system for treating substrate
SAMSUNG ELECTRONICS CO LTD3 citations72
US9859432B2Jan 2, 2018
Semiconductor devices having spacer protection pattern
SAMSUNG ELECTRONICS CO LTD6 citations71
US9677002B2Jun 13, 2017
Etching composition
SAMSUNG ELECTRONICS CO LTD2 citations71
US9660186B2May 23, 2017
Method of inspecting by-products and method of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD3 citations71
US9534839B2Jan 3, 2017
Apparatus and methods for treating a substrate
SAMSUNG ELECTRONICS CO LTD5 citations70
US9136120B2Sep 15, 2015
Compositions for etching and methods of forming a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD3 citations61
US11527399B2Dec 13, 2022
Wafer cleaning apparatus based on light irradiation and wafer cleaning system including the same
SAMSUNG ELECTRONICS CO LTD1 citations53
US10084051B2Sep 25, 2018
Semiconductor devices including field effect transistors and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US10128120B2Nov 13, 2018
Method of treating a layer
SAMSUNG ELECTRONICS CO LTD0 citations51
US10096453B2Oct 9, 2018
Method and apparatus for plasma etching
SAMSUNG ELECTRONICS CO LTD0 citations51
US9165759B2Oct 20, 2015
Etching composition and method of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD1 citations50
US11302526B2Apr 12, 2022
Supercritical drying apparatus and method of drying substrate using the same
SAMSUNG ELECTRONICS CO LTD0 citations48
US11342203B2May 24, 2022
Substrate cleaning apparatus and substrate cleaning method using the same
SAMSUNG ELECTRONICS CO LTD0 citations45
US9934959B2Apr 3, 2018
Method and apparatus for purifying cleaning agent
SAMSUNG ELECTRONICS CO LTD0 citations41