P

Inventor

AFZALIAN ARYAN

BE21 patents
⚠️ This page may combine multiple inventors who share the name “AFZALIAN ARYAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

18 patents
US9472468B2Oct 18, 2016

Nanowire CMOS structure and formation methods

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US11024729B2Jun 1, 2021

Method for manufacturing semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11018226B2May 25, 2021

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10483380B2Nov 19, 2019

Semiconductor device and method of manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12283626B2Apr 22, 2025

Semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11894451B2Feb 6, 2024

Semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11688771B2Jun 27, 2023

Method for manufacturing semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10896974B2Jan 19, 2021

Method of fabricating semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10276566B2Apr 30, 2019

Leakage current suppression methods and related structures

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US10541303B2Jan 21, 2020

Nanowire FinFET Transistor

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10008567B2Jun 26, 2018

Nanowire FinFet transistor

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9679968B2Jun 13, 2017

Field effect transistors and methods of forming same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11264452B2Mar 1, 2022

Hetero-tunnel field-effect transistor (TFET) having a tunnel barrier formed directly above channel region, directly below first source/drain region and adjacent gate electrode

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10861962B2Dec 8, 2020

Semiconductor device and method of fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10475908B2Nov 12, 2019

Semiconductor device and method of fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10269944B2Apr 23, 2019

Fin semiconductor device and method of manufacture with source/drain regions having opposite conductivities

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9818744B2Nov 14, 2017

Leakage current suppression methods and related structures

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9685528B2Jun 20, 2017

Fin semiconductor device and method of manufacture with source/drain regions having opposite conductivities

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51

IMEC VZW

2 patents

TAIWAN SEMICONDUCTOR MFG

1 patent