Inventor
AFZALIAN ARYAN
BE21 patents
⚠️ This page may combine multiple inventors who share the name “AFZALIAN ARYAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
18 patentsUS9472468B2Oct 18, 2016
Nanowire CMOS structure and formation methods
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US11024729B2Jun 1, 2021
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11018226B2May 25, 2021
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10483380B2Nov 19, 2019
Semiconductor device and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12283626B2Apr 22, 2025
Semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11894451B2Feb 6, 2024
Semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11688771B2Jun 27, 2023
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10896974B2Jan 19, 2021
Method of fabricating semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10276566B2Apr 30, 2019
Leakage current suppression methods and related structures
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US10541303B2Jan 21, 2020
Nanowire FinFET Transistor
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10008567B2Jun 26, 2018
Nanowire FinFet transistor
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9679968B2Jun 13, 2017
Field effect transistors and methods of forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11264452B2Mar 1, 2022
Hetero-tunnel field-effect transistor (TFET) having a tunnel barrier formed directly above channel region, directly below first source/drain region and adjacent gate electrode
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10861962B2Dec 8, 2020
Semiconductor device and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10475908B2Nov 12, 2019
Semiconductor device and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10269944B2Apr 23, 2019
Fin semiconductor device and method of manufacture with source/drain regions having opposite conductivities
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9818744B2Nov 14, 2017
Leakage current suppression methods and related structures
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9685528B2Jun 20, 2017
Fin semiconductor device and method of manufacture with source/drain regions having opposite conductivities
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51