Inventor

VELDMAN ANDREI

US23 patents

⚠️ This page may combine multiple inventors who share the name “VELDMAN ANDREI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VELDMAN ANDREI

KLA TENCOR CORP

Methods and apparatus for measuring semiconductor device overlay using X-ray metrology

Full beam metrology for X-ray scatterometry systems

Optical metrology tool equipped with modulated illumination sources

Time-domain computation of scattering spectra for use in spectroscopic metrology

Optimizing computational efficiency by multiple truncation of spatial harmonics

Metrology system optimization for parameter tracking

Methods and systems for characterization of an x-ray beam with high spatial resolution

Hybrid metrology for patterned wafer characterization

Visualization of three-dimensional semiconductor structures

Optimizing computational efficiency by multiple truncation of spatial harmonics

Optical metrology tool equipped with modulated illumination sources

Phase revealing optical and X-ray semiconductor metrology

Optical metrology tool equipped with modulated illumination sources

KLA CORP

Full beam metrology for x-ray scatterometry systems

Visualization of three-dimensional semiconductor structures

Full beam metrology for x-ray scatterometry systems

Optical metrology tool equipped with modulated illumination sources

KLA TENCOR TECH CORP

Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction

Method for optimizing the configuration of a scatterometry measurement system

VELDMAN ANDREI

Model-based metrology using tesselation-based discretization

Computation efficiency by iterative spatial harmonics order truncation

HENCH JOHN

Measuring critical dimensions of a semiconductor structure

APPLIED MATERIALS INC

Method for determining a profile quality grade of an inspected feature