Inventor
KUZNETSOV ALEXANDER
US37 patents
⚠️ This page may combine multiple inventors who share the name “KUZNETSOV ALEXANDER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
21 patentsUS10895541B2Jan 19, 2021
Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy
KLA TENCOR CORP21 citations94
US10769320B2Sep 8, 2020
Integrated use of model-based metrology and a process model
KLA TENCOR CORP23 citations94
US9518916B1Dec 13, 2016
Compressive sensing for metrology
KLA TENCOR CORP38 citations93
US9243886B1Jan 26, 2016
Optical metrology of periodic targets in presence of multiple diffraction orders
KLA TENCOR CORP34 citations93
US8860937B1Oct 14, 2014
Metrology systems and methods for high aspect ratio and large lateral dimension structures
KLA TENCOR CORP35 citations93
US8879073B2Nov 4, 2014
Optical metrology using targets with field enhancement elements
KLA TENCOR CORP23 citations90
US11333621B2May 17, 2022
Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction
KLA TENCOR CORP10 citations85
US11036898B2Jun 15, 2021
Measurement models of nanowire semiconductor structures based on re-useable sub-structures
KLA TENCOR CORP13 citations85
US10502694B2Dec 10, 2019
Methods and apparatus for patterned wafer characterization
KLA TENCOR CORP7 citations84
US10215559B2Feb 26, 2019
Metrology of multiple patterning processes
KLA TENCOR CORP2 citations73
US10983227B2Apr 20, 2021
On-device metrology using target decomposition
KLA TENCOR CORP3 citations72
US9255877B2Feb 9, 2016
Metrology system optimization for parameter tracking
KLA TENCOR CORP6 citations72
US11073487B2Jul 27, 2021
Methods and systems for characterization of an x-ray beam with high spatial resolution
KLA TENCOR CORP3 citations71
US10816486B2Oct 27, 2020
Multilayer targets for calibration and alignment of X-ray based measurement systems
KLA TENCOR CORP2 citations71
US10712145B2Jul 14, 2020
Hybrid metrology for patterned wafer characterization
KLA TENCOR CORP6 citations71
US11378451B2Jul 5, 2022
Bandgap measurements of patterned film stacks using spectroscopic metrology
KLA TENCOR CORP3 citations70
US11156548B2Oct 26, 2021
Measurement methodology of advanced nanostructures
KLA TENCOR CORP6 citations69
US10504759B2Dec 10, 2019
Semiconductor metrology with information from multiple processing steps
KLA TENCOR CORP1 citations62
US10062157B2Aug 28, 2018
Compressive sensing for metrology
KLA TENCOR CORP1 citations51
US10580673B2Mar 3, 2020
Semiconductor metrology and defect classification using electron microscopy
KLA TENCOR CORP0 citations41
US10804167B2Oct 13, 2020
Methods and systems for co-located metrology
KLA TENCOR CORP0 citations40
KLA CORP
9 patentsUS11698251B2Jul 11, 2023
Methods and systems for overlay measurement based on soft X-ray Scatterometry
KLA CORP2 citations73
US11460418B2Oct 4, 2022
Methods and systems for semiconductor metrology based on wavelength resolved soft X-ray reflectometry
KLA CORP2 citations71
US11604420B2Mar 14, 2023
Self-calibrating overlay metrology
KLA CORP2 citations70
US11143604B1Oct 12, 2021
Soft x-ray optics with improved filtering
KLA CORP4 citations70
US11536674B2Dec 27, 2022
Systems and methods for combined reflectometry and photoelectron spectroscopy
KLA CORP0 citations62
US12025575B2Jul 2, 2024
Soft x-ray optics with improved filtering
KLA CORP0 citations60
US11880142B2Jan 23, 2024
Self-calibrating overlay metrology
KLA CORP0 citations59
US11796390B2Oct 24, 2023
Bandgap measurements of patterned film stacks using spectroscopic metrology
KLA CORP0 citations59
US11604063B2Mar 14, 2023
Self-calibrated overlay metrology using a skew training sample
KLA CORP1 citations59