Inventor · disambiguated record
Ryoji Hamasaki
Also filed as: HAMASAKI RYOJI
5 granted patents·7 pending applications·160 citations·filing 1995–2025
84Inventor score
Top patents by PatentIndex Score
12 records- 0191US5895586APlasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminumHITACHI LTD·Filed 1995·Granted Apr 20, 1999·74 cites·5 claims
- 0290US5874012APlasma processing apparatus and plasma processing methodHITACHI LTD·Filed 1996·Granted Feb 23, 1999·60 cites·31 claims
- 0379US2025253167A1Plasma processing device and plasma processing method using sameHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 0473US2023282491A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2023·Application pending·0 cites
- 0571US7565879B2Plasma processing apparatusHITACHI LTD·Filed 2004·Granted Jul 28, 2009·6 cites·4 claims
- 0665US7208422B2Plasma processing methodHITACHI LTD·Filed 2004·Granted Apr 24, 2007·4 cites·28 claims
- 0761US2009289035A1Plasma Processing Apparatus And Plasma Processing MethodKANAI SABURO·Filed 2009·Application pending·0 cites
- 0856US2006249254A1Plasma processing apparatus and plasma processing methodKANAI SABURO·Filed 2006·Application pending·0 cites
- 0955US2010140224A1Plasma Processing Apparatus And Plasma Processing MethodKANAI SABURO·Filed 2010·Application pending·0 cites
- 1050US2018047595A1Plasma processing device and plasma processing method using sameHITACHI HIGH TECH CORP·Filed 2016·Application pending·0 cites
- 1149US6156663AMethod and apparatus for plasma processingHITACHI LTD·Filed 1996·Granted Dec 5, 2000·16 cites·11 claims
- 1241US2008112780A1Vacuum processing apparatusMATANO KATSUJI·Filed 2007·Application pending·0 cites
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