Inventor
ONO TETSUO
JP64 patents
⚠️ This page may combine multiple inventors who share the name “ONO TETSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
24 patentsUS5110407AMay 5, 1992
Surface fabricating device
HITACHI LTD521 citations98
US5895586AApr 20, 1999
Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum
HITACHI LTD74 citations96
US5891252AApr 6, 1999
Plasma processing apparatus
HITACHI LTD60 citations96
US4933602AJun 12, 1990
Apparatus for generating light by utilizing microwave
HITACHI LTD35 citations93
US6849191B2Feb 1, 2005
Method and apparatus for treating surface of semiconductor
HITACHI LTD24 citations92
US6759253B2Jul 6, 2004
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
HITACHI LTD27 citations92
US6677244B2Jan 13, 2004
Specimen surface processing method
HITACHI LTD18 citations92
US6660647B1Dec 9, 2003
Method for processing surface of sample
HITACHI LTD28 citations92
US6033481AMar 7, 2000
Plasma processing apparatus
HITACHI LTD41 citations92
US5462635AOct 31, 1995
Surface processing method and an apparatus for carrying out the same
HITACHI LTD24 citations92
US5505778AApr 9, 1996
Surface treating apparatus, surface treating method and semiconductor device manufacturing method
HITACHI LTD24 citations91
US5034655AJul 23, 1991
Circular fluorescent lamp
HITACHI LTD30 citations91
US7601241B2Oct 13, 2009
Plasma processing apparatus and plasma processing method
HITACHI LTD9 citations84
US4879493ANov 7, 1989
Low-pressure discharge lamp
HITACHI LTD22 citations79
US6967109B2Nov 22, 2005
Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
HITACHI LTD6 citations74
US4611148ASep 9, 1986
Low-pressure mercury vapor discharge lamp
HITACHI LTD5 citations74
US6767838B1Jul 27, 2004
Method and apparatus for treating surface of semiconductor
HITACHI LTD11 citations73
US5401357AMar 28, 1995
Dry etching method
HITACHI LTD17 citations73
US7259104B2Aug 21, 2007
Sample surface processing method
HITACHI LTD2 citations63
US6492277B1Dec 10, 2002
Specimen surface processing method and apparatus
HITACHI LTD4 citations63
US4803401AFeb 7, 1989
Compact fluorescent lamp
HITACHI LTD4 citations63
US4642512AFeb 10, 1987
Stain resistant fluorescent lamp
HITACHI LTD6 citations63
US4587453AMay 6, 1986
Low-pressure mercury vapor discharge lamp
HITACHI LTD3 citations63
US6656752B1Dec 2, 2003
Ion current density measuring method and instrument, and semiconductor device manufacturing method
HITACHI LTD5 citations62
HITACHI HIGH TECH CORP
13 patentsUS8889024B2Nov 18, 2014
Plasma etching method
HITACHI HIGH TECH CORP17 citations92
US10600619B2Mar 24, 2020
Plasma processing apparatus
HITACHI HIGH TECH CORP11 citations85
US9349603B2May 24, 2016
Plasma processing method
HITACHI HIGH TECH CORP11 citations83
US8969211B2Mar 3, 2015
Method and apparatus for plasma processing
HITACHI HIGH TECH CORP8 citations82
US10090162B2Oct 2, 2018
Plasma processing method and plasma processing device
HITACHI HIGH TECH CORP3 citations73
US7259866B2Aug 21, 2007
Semiconductor fabricating apparatus with function of determining etching processing state
HITACHI HIGH TECH CORP9 citations73
US6700090B2Mar 2, 2004
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP9 citations73
US9514967B2Dec 6, 2016
Plasma processing apparatus
HITACHI HIGH TECH CORP4 citations72
US10121640B2Nov 6, 2018
Method and apparatus for plasma processing
HITACHI HIGH TECH CORP4 citations71
US11658011B2May 23, 2023
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US7611993B2Nov 3, 2009
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP2 citations62
US6888094B2May 3, 2005
Plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP3 citations62
US12094687B2Sep 17, 2024
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations59
MITSUBISHI HEAVY IND LTD
5 patentsUS5074761ADec 24, 1991
Rotary compressor
MITSUBISHI HEAVY IND LTD59 citations95
US5074760ADec 24, 1991
Scroll type compressor
MITSUBISHI HEAVY IND LTD110 citations95
US4886425ADec 12, 1989
Capacity control device of scroll-type fluid compressor
MITSUBISHI HEAVY IND LTD50 citations89
US4696084ASep 29, 1987
Method for forming scroll members used in a scroll type fluid machine
MITSUBISHI HEAVY IND LTD13 citations71
US4666380AMay 19, 1987
Scroll type fluid machine with prevention of stress concentration
MITSUBISHI HEAVY IND LTD16 citations71
CENTRAL RES INST ELECT
3 patentsUS6083286AJul 4, 2000
High-concentration coal/water mixture fuel and process for production thereof
CENTRAL RES INST ELECT15 citations82
US5012984AMay 7, 1991
Process for production of coal-water mixture
CENTRAL RES INST ELECT20 citations77
US6488722B1Dec 3, 2002
Method and apparatus for spheroidizing particles
CENTRAL RES INST ELECT6 citations74
INOUE YOSHIHARU
2 patentsMORIMOTO MICHIKAZU
1 patentHITACH HIGH TECHNOLOGIES CORP
1 patentTERAOKA SEIKO KK
1 patentShowing the top 50 of 64 patents by PatentIndex Score.