P

Inventor

SASAKI YUICHIRO

JP92 patents
⚠️ This page may combine multiple inventors who share the name “SASAKI YUICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PANASONIC CORP

17 patents
US7759254B2Jul 20, 2010

Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device

PANASONIC CORP21 citations92
US7666770B2Feb 23, 2010

Method of controlling impurity doping and impurity doping apparatus

PANASONIC CORP24 citations92
US7601619B2Oct 13, 2009

Method and apparatus for plasma processing

PANASONIC CORP32 citations92
US7700382B2Apr 20, 2010

Impurity introducing method using optical characteristics to determine annealing conditions

PANASONIC CORP10 citations84
US7456085B2Nov 25, 2008

Method for introducing impurities

PANASONIC CORP14 citations84
US8004045B2Aug 23, 2011

Semiconductor device and method for producing the same

PANASONIC CORP11 citations83
US7800165B2Sep 21, 2010

Semiconductor device and method for producing the same

PANASONIC CORP7 citations74
US7754503B2Jul 13, 2010

Method for producing semiconductor device and semiconductor producing apparatus

PANASONIC CORP7 citations74
US7741199B2Jun 22, 2010

Method for introducing impurities and apparatus for introducing impurities

PANASONIC CORP6 citations74
US7709362B2May 4, 2010

Method for introducing impurities and apparatus for introducing impurities

PANASONIC CORP6 citations74
US7696072B2Apr 13, 2010

Method for introduction impurities and apparatus for introducing impurities

PANASONIC CORP6 citations74
US7618883B2Nov 17, 2009

Method for introducing impurities and apparatus for introducing impurities

PANASONIC CORP6 citations74
US8030187B2Oct 4, 2011

Method for manufacturing semiconductor device

PANASONIC CORP2 citations63
US7981779B2Jul 19, 2011

Method for making junction and processed material formed using the same

PANASONIC CORP2 citations63
US7972945B2Jul 5, 2011

Plasma doping apparatus and method, and method for manufacturing semiconductor device

PANASONIC CORP4 citations63
US7939388B2May 10, 2011

Plasma doping method and plasma doping apparatus

PANASONIC CORP2 citations63
US7863168B2Jan 4, 2011

Plasma doping method and plasma doping apparatus

PANASONIC CORP2 citations63

HITACHI KOKI KK

11 patents

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

9 patents

SASAKI YUICHIRO

5 patents

SAMSUNG ELECTRONICS CO LTD

5 patents

SHINETSU POLYMER CO

2 patents

SUMITOMO HEAVY INDUSTRIES

1 patent

Showing the top 50 of 92 patents by PatentIndex Score.