Inventor

MIZUNO BUNJI

JP70 patents

⚠️ This page may combine multiple inventors who share the name “MIZUNO BUNJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MIZUNO BUNJI

PANASONIC CORP

Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device

Method and apparatus for plasma processing

Impurity introducing method using optical characteristics to determine annealing conditions

Method for introducing impurities

Semiconductor device and method for producing the same

Semiconductor device and method for producing the same

Method for producing semiconductor device and semiconductor producing apparatus

Method for introducing impurities and apparatus for introducing impurities

Method for introducing impurities and apparatus for introducing impurities

Method for introduction impurities and apparatus for introducing impurities

Method for introducing impurities and apparatus for introducing impurities

Method for manufacturing semiconductor device

Method for making junction and processed material formed using the same

Plasma doping apparatus and method, and method for manufacturing semiconductor device

Plasma doping method and plasma doping apparatus

Plasma doping method and plasma doping apparatus

Plasma processing method and plasma processing apparatus

Plasma doping method

Method of doping impurities, and electronic element using the same

Charge neutralizing device

Method and apparatus of fabricating semiconductor device

Beam current measuring instrument and beam current measuring method using same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Plasma doping method

Plasma doping process and apparatus therefor

Method for removing impurities existing in semiconductor substrate

Plasma doping method

Plasma doping method and plasma doping apparatus

Plasma doping method

Method of fabricating a semiconductor device having buried insulation layer separated by ditches

Method of plasma doping

Impurity introduction method and apparatus thereof and method of manufacturing semiconductor device

Impurity doping method

Method for fabricating a semiconductor device by high energy ion implantation while minimizing damage within the semiconductor substrate

Ion-implanting apparatus, ion-implanting method, and device manufactured thereby

Plasma processing method and apparatus

Ion implantation apparatus and fabrication method for semiconductor device

Method for making a semiconductor device

Production method for a semiconductor device

Method of manufacturing semiconductor device by sputter doping

Production method for a semiconductor device

SASAKI YUICHIRO

Method for introducing impurities and apparatus for introducing impurities

Semiconductor device and method for fabricating the same

Method for producing a semiconductor device have fin-shaped semiconductor regions

Semiconductor device and method for producing the same

Semiconductor device

Method for fabricating semiconductor device and plasma doping system

Semiconductor device and method for fabricating the same

PANASONIC IP MAN CO LTD

Plasma processing apparatus and plasma processing method

SUMITOMO HEAVY INDUSTRIES

Process for fabricating semiconductor device

RIKEN

Beam current sensor