Inventor
CEBUHAR WENCESLAO A
US18 patents
⚠️ This page may combine multiple inventors who share the name “CEBUHAR WENCESLAO A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML HOLDING NV
16 patentsUS6831768B1Dec 14, 2004
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
ASML HOLDING NV39 citations94
US7133121B2Nov 7, 2006
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
ASML HOLDING NV13 citations92
US6876440B1Apr 5, 2005
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
ASML HOLDING NV22 citations92
US7061591B2Jun 13, 2006
Maskless lithography systems and methods utilizing spatial light modulator arrays
ASML HOLDING NV24 citations91
US7006295B2Feb 28, 2006
Illumination system and method for efficiently illuminating a pattern generator
ASML HOLDING NV15 citations91
US7410736B2Aug 12, 2008
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
ASML HOLDING NV15 citations83
US6985280B2Jan 10, 2006
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
ASML HOLDING NV4 citations72
US7688423B2Mar 30, 2010
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
ASML HOLDING NV3 citations62
US7542013B2Jun 2, 2009
System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
ASML HOLDING NV2 citations62
US7463402B2Dec 9, 2008
Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography
ASML HOLDING NV1 citations61
US7158307B2Jan 2, 2007
Efficiently illuminating a modulating device
ASML HOLDING NV4 citations61
US7859735B2Dec 28, 2010
Systems and methods for minimizing scattered light in multi-SLM maskless lithography
ASML HOLDING NV2 citations60
US7567368B2Jul 28, 2009
Systems and methods for minimizing scattered light in multi-SLM maskless lithography
ASML HOLDING NV3 citations60
US7773199B2Aug 10, 2010
Methods and systems to compensate for a stitching disturbance of a printed pattern
ASML HOLDING NV0 citations51
US7630054B2Dec 8, 2009
Methods and systems to compensate for a stitching disturbance of a printed pattern
ASML HOLDING NV0 citations51
US7403266B2Jul 22, 2008
Maskless lithography systems and methods utilizing spatial light modulator arrays
ASML HOLDING NV1 citations48