Inventor
LIU ZHENDONG
US44 patents
⚠️ This page may combine multiple inventors who share the name “LIU ZHENDONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MAT
10 patentsUS7018560B2Mar 28, 2006
Composition for polishing semiconductor layers
ROHM & HAAS ELECT MAT49 citations92
US6971945B2Dec 6, 2005
Multi-step polishing solution for chemical mechanical planarization
ROHM & HAAS ELECT MAT21 citations91
US7427362B2Sep 23, 2008
Corrosion-resistant barrier polishing solution
ROHM & HAAS ELECT MAT16 citations84
US8025813B2Sep 27, 2011
Chemical mechanical polishing composition and methods relating thereto
ROHM & HAAS ELECT MAT11 citations83
US7300480B2Nov 27, 2007
High-rate barrier polishing composition
ROHM & HAAS ELECT MAT13 citations82
US7300603B2Nov 27, 2007
Chemical mechanical planarization compositions for reducing erosion in semiconductor wafers
ROHM & HAAS ELECT MAT8 citations74
US7253111B2Aug 7, 2007
Barrier polishing solution
ROHM & HAAS ELECT MAT9 citations72
US7300602B2Nov 27, 2007
Selective barrier metal polishing solution
ROHM & HAAS ELECT MAT6 citations71
US7842192B2Nov 30, 2010
Multi-component barrier polishing solution
ROHM & HAAS ELECT MAT5 citations62
US7981316B2Jul 19, 2011
Selective barrier metal polishing method
ROHM & HAAS ELECT MAT1 citations50
LIU ZHENDONG
8 patentsUS8071479B2Dec 6, 2011
Chemical mechanical polishing composition and methods relating thereto
LIU ZHENDONG13 citations83
USD1037599SJul 30, 2024
Kayak roller with suction cup
LIU ZHENDONG3 citations74
US8513126B2Aug 20, 2013
Slurry composition having tunable dielectric polishing selectivity and method of polishing a substrate
LIU ZHENDONG5 citations71
USD1097054SOct 7, 2025
Fishing rod holder
LIU ZHENDONG0 citations62
US9752228B2Sep 5, 2017
Sputtering target for PVD chamber
LIU ZHENDONG1 citations52
US8735293B2May 27, 2014
Chemical mechanical polishing composition and methods relating thereto
LIU ZHENDONG1 citations51
US9873535B2Jan 23, 2018
Molybdate-free sterilizing and pasteurizing solutions
LIU ZHENDONG1 citations43
US8568610B2Oct 29, 2013
Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrate
LIU ZHENDONG0 citations40
GUO YI
7 patentsUS8119529B2Feb 21, 2012
Method for chemical mechanical polishing a substrate
GUO YI9 citations84
US8492277B2Jul 23, 2013
Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride
GUO YI9 citations82
US8431490B2Apr 30, 2013
Method of chemical mechanical polishing a substrate with polishing composition adapted to enhance silicon oxide removal
GUO YI5 citations71
US8232208B2Jul 31, 2012
Stabilized chemical mechanical polishing composition and method of polishing a substrate
GUO YI3 citations61
US8444728B2May 21, 2013
Stabilized chemical mechanical polishing composition and method of polishing a substrate
GUO YI1 citations51
US8496843B2Jul 30, 2013
Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride
GUO YI0 citations40
US8491808B2Jul 23, 2013
Method of polishing a substrate comprising polysilicon, silicon oxide and silicon nitride
GUO YI0 citations40
APPLIED MATERIALS INC
6 patentsUS8895450B2Nov 25, 2014
Low resistivity tungsten PVD with enhanced ionization and RF power coupling
APPLIED MATERIALS INC16 citations92
US9583349B2Feb 28, 2017
Lowering tungsten resistivity by replacing titanium nitride with titanium silicon nitride
APPLIED MATERIALS INC17 citations83
US7884032B2Feb 8, 2011
Thin film deposition
APPLIED MATERIALS INC10 citations83
US10763090B2Sep 1, 2020
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process
APPLIED MATERIALS INC3 citations73
US10718049B2Jul 21, 2020
Process kit shield for improved particle reduction
APPLIED MATERIALS INC0 citations52
US10060024B2Aug 28, 2018
Sputtering target for PVD chamber
APPLIED MATERIALS INC0 citations52