Inventor
FUMITAKE MIENO
CN40 patents
⚠️ This page may combine multiple inventors who share the name “FUMITAKE MIENO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUMITAKE MIENO
15 patentsUS8518781B2Aug 27, 2013
Semiconductor device and manufacturing method thereof
FUMITAKE MIENO16 citations84
US8114732B2Feb 14, 2012
Method for manufacturing twin bit structure cell with Al2O3/nano-crystalline Si layer
FUMITAKE MIENO8 citations84
US8716080B2May 6, 2014
Semiconductor device manufacturing method
FUMITAKE MIENO4 citations73
US8679950B2Mar 25, 2014
Manufacturing method for semiconductor device having side by side different fins
FUMITAKE MIENO6 citations73
US8748247B2Jun 10, 2014
Fin field-effect-transistor (FET) structure and manufacturing method
FUMITAKE MIENO2 citations62
US8569757B2Oct 29, 2013
Semiconductor device with amorphous silicon MAS memory cell structure and manufacturing method thereof
FUMITAKE MIENO2 citations62
US9064804B2Jun 23, 2015
Method for manufacturing twin bit structure cell with silicon nitride layer
FUMITAKE MIENO1 citations52
US8748260B2Jun 10, 2014
Method for manufacturing nano-crystalline silicon material for semiconductor integrated circuits
FUMITAKE MIENO0 citations52
US8685826B2Apr 1, 2014
Method for manufacturing nano-crystalline silicon material from chloride chemistries for the semiconductor integrated circuits
FUMITAKE MIENO0 citations52
US8546224B2Oct 1, 2013
Method for manufacturing twin bit structure cell with aluminum oxide layer
FUMITAKE MIENO1 citations52
US8487366B2Jul 16, 2013
TFT MONOS or SONOS memory cell structures
FUMITAKE MIENO0 citations52
US8247864B2Aug 21, 2012
Amorphous silicon MONOS or MAS memory cell structure with OTP function
FUMITAKE MIENO1 citations52
US8143666B2Mar 27, 2012
Semiconductor device with amorphous silicon monos memory cell structure and method for manufacturing thereof
FUMITAKE MIENO1 citations52
US8753956B2Jun 17, 2014
Semiconductor structure and fabrication method
FUMITAKE MIENO0 citations50
US8598001B2Dec 3, 2013
Method for manufacturing twin bit structure cell with hafnium oxide and nano-crystalline silicon layer
FUMITAKE MIENO0 citations41
SEMICONDUCTOR MFG INT SHANGHAI
12 patentsUS8883585B1Nov 11, 2014
Fin field-effect transistors and fabrication method thereof
SEMICONDUCTOR MFG INT SHANGHAI32 citations94
US8809173B1Aug 19, 2014
Fin field-effect transistors and fabrication method thereof
SEMICONDUCTOR MFG INT SHANGHAI33 citations94
US9287387B2Mar 15, 2016
Static memory cell and formation method thereof
SEMICONDUCTOR MFG INT SHANGHAI6 citations84
US9054193B2Jun 9, 2015
Fin field-effect transistors
SEMICONDUCTOR MFG INT SHANGHAI6 citations84
US7625796B2Dec 1, 2009
Semiconductor device with amorphous silicon MONOS memory cell structure and method for manufacturing thereof
SEMICONDUCTOR MFG INT SHANGHAI9 citations84
US9362331B2Jun 7, 2016
Method and system for image sensor and lens on a silicon back plane wafer
SEMICONDUCTOR MFG INT SHANGHAI3 citations73
US9190331B2Nov 17, 2015
Semiconductor device and manufacturing method thereof
SEMICONDUCTOR MFG INT SHANGHAI4 citations73
US7892904B2Feb 22, 2011
Amorphous silicon MONOS or MAS memory cell structure with OTP function
SEMICONDUCTOR MFG INT SHANGHAI5 citations63
US6967161B2Nov 22, 2005
Method and resulting structure for fabricating DRAM cell structure using oxide line spacer
SEMICONDUCTOR MFG INT SHANGHAI5 citations62
US9190330B2Nov 17, 2015
Semiconductor device and manufacturing method thereof
SEMICONDUCTOR MFG INT SHANGHAI0 citations52
US9362286B2Jun 7, 2016
Fin field effect transistor and method for forming the same
SEMICONDUCTOR MFG INT SHANGHAI1 citations51
US7989363B2Aug 2, 2011
Method for rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of dielectric films
SEMICONDUCTOR MFG INT SHANGHAI0 citations39
SEMICONDUCTOR MFG INT CORP
6 patentsUS8877575B2Nov 4, 2014
Complementary junction field effect transistor device and its gate-last fabrication method
SEMICONDUCTOR MFG INT CORP7 citations84
US8871583B2Oct 28, 2014
Semiconductor device and manufacturing method thereof
SEMICONDUCTOR MFG INT CORP7 citations84
US8716764B2May 6, 2014
Semiconductor device and manufacturing method thereof
SEMICONDUCTOR MFG INT CORP8 citations84
US9293550B2Mar 22, 2016
Semiconductor device and manufacturing method thereof
SEMICONDUCTOR MFG INT CORP4 citations73
US9117906B2Aug 25, 2015
Fin field-effect transistors and fabrication method thereof
SEMICONDUCTOR MFG INT CORP4 citations73
US9112020B2Aug 18, 2015
Transistor device
SEMICONDUCTOR MFG INT CORP0 citations48