P

Inventor

SIEKMANN HEIKO

DE8 patents
⚠️ This page may combine multiple inventors who share the name “SIEKMANN HEIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZEISS CARL SMT GMBH

4 patents
US8976927B2Mar 10, 2015

Substrate for mirrors for EUV lithography

ZEISS CARL SMT GMBH6 citations71
US9217930B2Dec 22, 2015

Illumination system for a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH1 citations60
US12196986B2Jan 14, 2025

Method for producing a substrate for an optical element

ZEISS CARL SMT GMBH0 citations56
US9575414B2Feb 21, 2017

Illumination system for a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH0 citations50

ZEISS CARL LASER OPTICS GMBH

1 patent
US9541685B2Jan 10, 2017

Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

ZEISS CARL LASER OPTICS GMBH10 citations80

ZEISS CARL SMT AG

1 patent
US7880969B2Feb 1, 2011

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

ZEISS CARL SMT AG4 citations60

WANGLER JOHANNES

1 patent
US8395756B2Mar 12, 2013

Illumination system for a microlithographic projection exposure apparatus

WANGLER JOHANNES2 citations58

WOLF OLIVER

1 patent
US8520307B2Aug 27, 2013

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

WOLF OLIVER4 citations54