Inventor
GERHARD MICHAEL
DE33 patents
⚠️ This page may combine multiple inventors who share the name “GERHARD MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
15 patentsUS6697199B2Feb 24, 2004
Objective with lenses made of a crystalline material
ZEISS CARL SMT AG52 citations96
US7145720B2Dec 5, 2006
Objective with fluoride crystal lenses
ZEISS CARL SMT AG49 citations95
US7199864B2Apr 3, 2007
Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
ZEISS CARL SMT AG18 citations92
US7112772B2Sep 26, 2006
Catadioptric projection objective with adaptive mirror and projection exposure method
ZEISS CARL SMT AG24 citations90
US6891980B2May 10, 2005
Method and apparatus for analysis of schlieren
ZEISS CARL SMT AG17 citations82
US7294814B2Nov 13, 2007
Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same
ZEISS CARL SMT AG10 citations81
US6667839B2Dec 23, 2003
Holding device for an optical element made of a crystalline material
ZEISS CARL SMT AG18 citations78
US7271876B2Sep 18, 2007
Projection objective for microlithography
ZEISS CARL SMT AG7 citations74
US7180667B2Feb 20, 2007
Objective with fluoride crystal lenses
ZEISS CARL SMT AG4 citations73
US6936825B2Aug 30, 2005
Process for the decontamination of microlithographic projection exposure devices
ZEISS CARL SMT AG8 citations68
US6842284B2Jan 11, 2005
Objective with lenses made of a crystalline material
ZEISS CARL SMT AG3 citations63
US7126765B2Oct 24, 2006
Objective with fluoride crystal lenses
ZEISS CARL SMT AG3 citations62
US6836379B2Dec 28, 2004
Catadioptric objective
ZEISS CARL SMT AG2 citations62
US7880969B2Feb 1, 2011
Optical integrator for an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT AG4 citations60
US7382536B2Jun 3, 2008
Objective with fluoride crystal lenses
ZEISS CARL SMT AG0 citations51
ZEISS CARL SMT GMBH
10 patentsUS9280060B2Mar 8, 2016
Illumination system for microlithography
ZEISS CARL SMT GMBH5 citations82
US8870396B2Oct 28, 2014
Substrates for mirrors for EUV lithography and their production
ZEISS CARL SMT GMBH5 citations72
US10578783B2Mar 3, 2020
Optical grating and optical assembly for same
ZEISS CARL SMT GMBH2 citations66
US7961298B2Jun 14, 2011
Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
ZEISS CARL SMT GMBH1 citations63
US9606441B2Mar 28, 2017
Illumination system for microlithography
ZEISS CARL SMT GMBH1 citations61
US9310693B2Apr 12, 2016
Method for operating a projection exposure tool and control apparatus
ZEISS CARL SMT GMBH1 citations52
US10088754B2Oct 2, 2018
Illumination system for microlithography
ZEISS CARL SMT GMBH0 citations50
US9341953B2May 17, 2016
Microlithographic illumination system
ZEISS CARL SMT GMBH0 citations50
US11555783B2Jan 17, 2023
Method for detecting particles on the surface of an object, wafer, and mask blank
ZEISS CARL SMT GMBH0 citations47
US9618387B2Apr 11, 2017
Method for determining the phase angle and/or the thickness of a contamination layer at an optical element and EUV lithography apparatus
ZEISS CARL SMT GMBH0 citations42