Inventor

MANASSEN AMNON

IL118 patents

⚠️ This page may combine multiple inventors who share the name “MANASSEN AMNON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MANASSEN AMNON

KLA TENCOR CORP

Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields

Overlay measurement based on moire effect between structured illumination and overlay target

Fit-to-pitch overlay measurement targets

Metrology systems and methods

Metrology systems and methods

Overlay metrology using multiple parameter configurations

Diffraction based overlay scatterometry

System and method for spectral tuning of broadband light sources

Simultaneous capturing of overlay signals from multiple targets

Simultaneous capturing of overlay signals from multiple targets

Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology

Apodization for pupil imaging scatterometry

Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures

Phase characterization of targets

Method for estimating and correcting misregistration target inaccuracy

Systems for providing illumination in optical metrology

Measurement of overlay error using device inspection system

Decreasing inaccuracy due to non-periodic effects on scatterometric signals

Single cell grey scatterometry overlay targets and their measurement using varying illumination parameter(s)

Enhancing metrology target information content

Systems and methods for optimizing focus for imaging-based overlay metrology

Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology

Systems and methods for metrology with layer-specific illumination spectra

System and method for generating multi-channel tunable illumination from a broadband source

Apodization for pupil imaging scatterometry

KLA CORP

Metrology target for scanning metrology

Multi-field scanning overlay metrology

Scanning scatterometry overlay measurement

Grey-mode scanning scatterometry overlay metrology

System and method for measuring misregistration of semiconductor device wafers utilizing induced topography

Measurement modes for overlay

Pupil-plane beam scanning for metrology

Parallel scatterometry overlay metrology

Scatterometry overlay metrology with orthogonal fine-pitch segmentation

Multi-directional overlay metrology using multiple illumination parameters and isolated imaging

Moiré scatterometry overlay

Single grab overlay measurement of tall targets

Imaging overlay with mutually coherent oblique illumination

Massive overlay metrology sampling with multiple measurement columns

Method of measuring misregistration in the manufacture of topographic semiconductor device wafers

MANASSEN AMNON

Inspection system with fiber coupled OCT focusing

Near field detection for optical metrology

Optics symmetrization for metrology

Illumination control

Overlay metrology by pupil phase analysis

3DV SYSTEMS LTD

Large aperture optical image shutter

Solid state image wavelength converter

KANDEL DANIEL

Metrology systems and methods

ADEL MICHAEL

Scatterometry metrology target design optimization

HILL ANDREW V

Discrete polarization scatterometry