Inventor

KANDEL DANIEL

IL67 patents

⚠️ This page may combine multiple inventors who share the name “KANDEL DANIEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KANDEL DANIEL

KLA TENCOR CORP

Symmetric target design in scatterometry overlay metrology

Metrology systems and methods

Metrology systems and methods

Target element types for process parameter metrology

Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology

Self-moire target design principles for measuring unresolved device-like pitches

Apodization for pupil imaging scatterometry

Method and system for providing a target design displaying high sensitivity to scanner focus change

Device-like scatterometry overlay targets

Optical gain approach for enhancement of overlay and alignment systems performance

On-device metrology

Symmetric target design in scatterometry overlay metrology

Phase characterization of targets

Systems for providing illumination in optical metrology

Decreasing inaccuracy due to non-periodic effects on scatterometric signals

Metrology using overlay and yield critical patterns

Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology

Self-moiré target design principles for measuring unresolved device-like pitches

Reducing algorithmic inaccuracy in scatterometry overlay metrology

Approach for model calibration used for focus and dose measurement

Structured illumination for contrast enhancement in overlay metrology

Apodization for pupil imaging scatterometry

Device metrology targets and methods

Near field metrology

Feed forward of metrology data in a metrology system

Focus measurements using scatterometry metrology

KANDEL DANIEL

Metrology systems and methods

Flexible scatterometry metrology system and method

Multi-layer overlay metrology target and complimentary overlay metrology measurement systems

Angle-resolved antisymmetric scatterometry

KLA TENCOR TECH CORP

Continuously varying offset mark and methods of determining overlay

Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals

Apparatus and methods for detecting overlay errors using scatterometry

MANASSEN AMNON

Optics symmetrization for metrology

Overlay metrology by pupil phase analysis

IZIKSON PAVEL

Substrate matrix to decouple tool and process effects

Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation

CA INC

Selective traffic blockage

Selective traffic blockage

ADEL MICHAEL

Scatterometry metrology target design optimization

AMIR NURIEL

Device correlated metrology (DCM) for OVL with embedded SEM structure overlay targets

HILL ANDREW V

Discrete polarization scatterometry

KLA TENCOR TECHNOLGIES CORP

Order selected overlay metrology

KLA—TENCOR CORP

Achieving a small pattern placement error in metrology targets

SYMANTEC CORP

Application-to-application device ID sharing

SELIGSON JOEL

Structured illumination for contrast enhancement in overlay metrology

KLA CORP

Metrology target design for tilted device designs

CHOI DONGSUB

Advanced process control optimization

NOVA MEASURING INSTR LTD

Metrology and process control for semiconductor manufacturing

NOVA LTD

Metrology and process control for semiconductor manufacturing