Inventor
TERAZAKI HIROKI
JP20 patents
⚠️ This page may combine multiple inventors who share the name “TERAZAKI HIROKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEMICAL CO LTD
11 patentsUS6221118B1Apr 24, 2001
Cerium oxide abrasive and method of polishing substrates
HITACHI CHEMICAL CO LTD123 citations98
US6863700B2Mar 8, 2005
Cerium oxide abrasive and method of polishing substrates
HITACHI CHEMICAL CO LTD37 citations96
US6343976B1Feb 5, 2002
Abrasive, method of polishing wafer, and method of producing semiconductor device
HITACHI CHEMICAL CO LTD60 citations96
US7250369B1Jul 31, 2007
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
HITACHI CHEMICAL CO LTD16 citations92
US7799688B2Sep 21, 2010
Polishing fluid and method of polishing
HITACHI CHEMICAL CO LTD8 citations83
US7708788B2May 4, 2010
Cerium oxide abrasive and method of polishing substrates
HITACHI CHEMICAL CO LTD6 citations73
US7115021B2Oct 3, 2006
Abrasive, method of polishing target member and process for producing semiconductor device
HITACHI CHEMICAL CO LTD8 citations73
US8038898B2Oct 18, 2011
Abrasive liquid for metal and method for polishing
HITACHI CHEMICAL CO LTD2 citations62
US7963825B2Jun 21, 2011
Abrasive, method of polishing target member and process for producing semiconductor device
HITACHI CHEMICAL CO LTD1 citations62
US7871308B2Jan 18, 2011
Abrasive, method of polishing target member and process for producing semiconductor device
HITACHI CHEMICAL CO LTD1 citations62
US7867303B2Jan 11, 2011
Cerium oxide abrasive and method of polishing substrates
HITACHI CHEMICAL CO LTD0 citations52
HITACHI LTD
3 patentsUS6899821B2May 31, 2005
Abrasive liquid for metal and method for polishing
HITACHI LTD31 citations92
US6896825B1May 24, 2005
Abrasive liquid for metal and method for polishing
HITACHI LTD30 citations92
US7799686B2Sep 21, 2010
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
HITACHI LTD1 citations62
UCHIDA TAKESHI
3 patentsUS8491807B2Jul 23, 2013
Abrasive liquid for metal and method for polishing
UCHIDA TAKESHI5 citations83
US8226849B2Jul 24, 2012
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
UCHIDA TAKESHI2 citations61
US8900477B2Dec 2, 2014
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
UCHIDA TAKESHI0 citations51
YOSHIDA MASATO
3 patentsUS8616936B2Dec 31, 2013
Abrasive, method of polishing target member and process for producing semiconductor device
YOSHIDA MASATO1 citations62
US8162725B2Apr 24, 2012
Abrasive, method of polishing target member and process for producing semiconductor device
YOSHIDA MASATO1 citations62
US8137159B2Mar 20, 2012
Abrasive, method of polishing target member and process for producing semiconductor device
YOSHIDA MASATO1 citations62