Inventor
KOYAMA NAOYUKI
JP20 patents
⚠️ This page may combine multiple inventors who share the name “KOYAMA NAOYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEMICAL CO LTD
8 patentsUS6786945B2Sep 7, 2004
Polishing compound and method for polishing substrate
HITACHI CHEMICAL CO LTD83 citations96
US7250369B1Jul 31, 2007
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
HITACHI CHEMICAL CO LTD16 citations92
US7838482B2Nov 23, 2010
CMP polishing compound and polishing method
HITACHI CHEMICAL CO LTD15 citations91
US7837800B2Nov 23, 2010
CMP polishing slurry and polishing method
HITACHI CHEMICAL CO LTD10 citations83
US8002860B2Aug 23, 2011
CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive
HITACHI CHEMICAL CO LTD12 citations81
US7410409B1Aug 12, 2008
Abrasive compound for CMP, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive compound
HITACHI CHEMICAL CO LTD9 citations81
US10040971B2Aug 7, 2018
Polishing agent and method for polishing substrate using the polishing agent
HITACHI CHEMICAL CO LTD1 citations62
US9165777B2Oct 20, 2015
Polishing agent and method for polishing substrate using the polishing agent
HITACHI CHEMICAL CO LTD0 citations51
FUKASAWA MASATO
4 patentsUS8168541B2May 1, 2012
CMP polishing slurry and polishing method
FUKASAWA MASATO2 citations60
US9293344B2Mar 22, 2016
Cmp polishing slurry and method of polishing substrate
FUKASAWA MASATO2 citations59
US8524111B2Sep 3, 2013
CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method
FUKASAWA MASATO1 citations49
US8900335B2Dec 2, 2014
CMP polishing slurry and method of polishing substrate
FUKASAWA MASATO0 citations39
UCHIDA TAKESHI
2 patentsUS8226849B2Jul 24, 2012
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
UCHIDA TAKESHI2 citations61
US8900477B2Dec 2, 2014
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
UCHIDA TAKESHI0 citations51