Inventor
WANG HUNG-CHUN
TW35 patents
⚠️ This page may combine multiple inventors who share the name “WANG HUNG-CHUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
14 patentsUS9529959B2Dec 27, 2016
System and method for pattern correction in e-beam lithography
TAIWAN SEMICONDUCTOR MFG CO LTD27 citations94
US10691864B2Jun 23, 2020
Method of post optical proximity correction (OPC) printing verification by machine learning
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations82
US11048161B2Jun 29, 2021
Optical proximity correction methodology using pattern classification for target placement
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10360339B2Jul 23, 2019
Method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9411924B2Aug 9, 2016
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10520829B2Dec 31, 2019
Optical proximity correction methodology using underlying layer information
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10049178B2Aug 14, 2018
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US9026955B1May 5, 2015
Methodology for pattern correction
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US11308256B2Apr 19, 2022
Method of post optical proximity correction (OPC) printing verification by machine learning
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US9418191B2Aug 16, 2016
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10860774B2Dec 8, 2020
Methodology for pattern density optimization
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10747938B2Aug 18, 2020
Method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10527928B2Jan 7, 2020
Optical proximity correction methodology using pattern classification for target placement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9165106B2Oct 20, 2015
Layout design for electron-beam high volume manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
TAIWAN SEMICONDUCTOR MFG
10 patentsUS9390217B2Jul 12, 2016
Methodology of optical proximity correction optimization
TAIWAN SEMICONDUCTOR MFG68 citations97
US9305799B2Apr 5, 2016
Method and system for E-beam lithography with multi-exposure
TAIWAN SEMICONDUCTOR MFG26 citations94
US8945803B2Feb 3, 2015
Smart subfield method for E-beam lithography
TAIWAN SEMICONDUCTOR MFG26 citations92
US8841049B2Sep 23, 2014
Electron beam data storage system and method for high volume manufacturing
TAIWAN SEMICONDUCTOR MFG28 citations92
US9262578B2Feb 16, 2016
Method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG9 citations83
US8949749B2Feb 3, 2015
Layout design for electron-beam high volume manufacturing
TAIWAN SEMICONDUCTOR MFG12 citations82
US9298083B2Mar 29, 2016
Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
TAIWAN SEMICONDUCTOR MFG2 citations62
US7348106B2Mar 25, 2008
Method for repairing a phase shift mask
TAIWAN SEMICONDUCTOR MFG2 citations62
US9336986B2May 10, 2016
Electron beam data storage system and method for high volume manufacturing
TAIWAN SEMICONDUCTOR MFG0 citations51
US7387855B2Jun 17, 2008
Anti-ESD photomask blank
TAIWAN SEMICONDUCTOR MFG1 citations46
WANG HUNG-CHUN
7 patentsUS8627241B2Jan 7, 2014
Pattern correction with location effect
WANG HUNG-CHUN45 citations94
US8631360B2Jan 14, 2014
Methodology of optical proximity correction optimization
WANG HUNG-CHUN34 citations93
US8601407B2Dec 3, 2013
Geometric pattern data quality verification for maskless lithography
WANG HUNG-CHUN31 citations92
US8473877B2Jun 25, 2013
Striping methodology for maskless lithography
WANG HUNG-CHUN26 citations92
US8468473B1Jun 18, 2013
Method for high volume e-beam lithography
WANG HUNG-CHUN34 citations92
US8464186B2Jun 11, 2013
Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
WANG HUNG-CHUN29 citations92
US8507159B2Aug 13, 2013
Electron beam data storage system and method for high volume manufacturing
WANG HUNG-CHUN29 citations91