Inventor
Wang shu-jin
NL8 patents
Patents
8 patentsUS10811323B2Oct 20, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV4 citations82
US9594299B2Mar 14, 2017
Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method
ASML NETHERLANDS BV13 citations80
US11947269B2Apr 2, 2024
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV2 citations71
US11143972B2Oct 12, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV1 citations71
US10983445B2Apr 20, 2021
Method and apparatus for measuring a parameter of interest using image plane detection techniques
ASML NETHERLANDS BV3 citations71
US11710668B2Jul 25, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations61
US12468235B2Nov 11, 2025
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations60
US9939735B2Apr 10, 2018
Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method
ASML NETHERLANDS BV1 citations48