Inventor
TANDOU TAKUMI
JP18 patents
⚠️ This page may combine multiple inventors who share the name “TANDOU TAKUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
9 patentsUS7771564B2Aug 10, 2010
Plasma processing apparatus
HITACHI HIGH TECH CORP10 citations83
US10825664B2Nov 3, 2020
Wafer processing method and wafer processing apparatus
HITACHI HIGH TECH CORP3 citations73
US10217613B2Feb 26, 2019
Plasma processing apparatus
HITACHI HIGH TECH CORP3 citations69
US8349127B2Jan 8, 2013
Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stage
HITACHI HIGH TECH CORP2 citations62
US8034181B2Oct 11, 2011
Plasma processing apparatus
HITACHI HIGH TECH CORP2 citations62
US7838792B2Nov 23, 2010
Plasma processing apparatus capable of adjusting temperature of sample stand
HITACHI HIGH TECH CORP4 citations62
US10103007B2Oct 16, 2018
Plasma processing apparatus with gas feed and evacuation conduit
HITACHI HIGH TECH CORP0 citations41
US9704731B2Jul 11, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations41
US10128141B2Nov 13, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations40
TANDOU TAKUMI
6 patentsUS8955579B2Feb 17, 2015
Plasma processing apparatus and plasma processing method
TANDOU TAKUMI8 citations83
US8833089B2Sep 16, 2014
Plasma processing apparatus and maintenance method therefor
TANDOU TAKUMI4 citations72
US9070724B2Jun 30, 2015
Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stage
TANDOU TAKUMI2 citations61
US8747763B2Jun 10, 2014
Plasma sterilization apparatus
TANDOU TAKUMI2 citations61
US9368377B2Jun 14, 2016
Plasma processing apparatus
TANDOU TAKUMI1 citations51
US8426764B2Apr 23, 2013
Plasma processing apparatus and plasma processing method
TANDOU TAKUMI1 citations51