Inventor
SHOEB JULINE
US18 patents
Patents
18 patentsUS10224183B1Mar 5, 2019
Multi-level parameter and frequency pulsing with a low angular spread
LAM RES CORP12 citations92
US10573494B2Feb 25, 2020
Multi-level parameter and frequency pulsing with a low angular spread
LAM RES CORP8 citations84
US10386828B2Aug 20, 2019
Methods and apparatuses for etch profile matching by surface kinetic model optimization
LAM RES CORP8 citations84
US10304660B1May 28, 2019
Multi-level pulsing of DC and RF signals
LAM RES CORP5 citations84
US11462390B2Oct 4, 2022
Multi-level parameter and frequency pulsing with a low angular spread
LAM RES CORP2 citations73
US11049693B2Jun 29, 2021
Systems and methods for achieving peak ion energy enhancement with a low angular spread
LAM RES CORP1 citations73
US10580618B2Mar 3, 2020
Multi-level pulsing of DC and RF signals
LAM RES CORP4 citations73
US10395894B2Aug 27, 2019
Systems and methods for achieving peak ion energy enhancement with a low angular spread
LAM RES CORP3 citations73
US12494345B2Dec 9, 2025
Pulsing RF coils of a plasma chamber in reverse synchronization
LAM RES CORP1 citations63
US12283461B2Apr 22, 2025
Systems and methods for achieving peak ion energy enhancement with a low angular spread
LAM RES CORP0 citations62
US12119232B2Oct 15, 2024
Etching isolation features and dense features within a substrate
LAM RES CORP0 citations62
US12068131B2Aug 20, 2024
Multi-level parameter and frequency pulsing with a low angular spread
LAM RES CORP0 citations62
US12057319B2Aug 6, 2024
Selective silicon dioxide removal using low pressure low bias deuterium plasma
LAM RES CORP0 citations62
US11915912B2Feb 27, 2024
Systems and methods for achieving peak ion energy enhancement with a low angular spread
LAM RES CORP0 citations62
US11569067B2Jan 31, 2023
Systems and methods for achieving peak ion energy enhancement with a low angular spread
LAM RES CORP0 citations62
US11398387B2Jul 26, 2022
Etching isolation features and dense features within a substrate
LAM RES CORP0 citations62
US11011351B2May 18, 2021
Monoenergetic ion generation for controlled etch
LAM RES CORP1 citations62
US10755896B2Aug 25, 2020
Multi-level pulsing of DC and RF signals
LAM RES CORP0 citations52