Inventor
NAGASEKI KAZUYA
JP72 patents
⚠️ This page may combine multiple inventors who share the name “NAGASEKI KAZUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
44 patentsUS6544380B2Apr 8, 2003
Plasma treatment method and apparatus
TOKYO ELECTRON LTD104 citations98
US6074518AJun 13, 2000
Plasma processing apparatus
TOKYO ELECTRON LTD276 citations98
US5942075AAug 24, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD277 citations98
US5919332AJul 6, 1999
Plasma processing apparatus
TOKYO ELECTRON LTD445 citations98
US5698062ADec 16, 1997
Plasma treatment apparatus and method
TOKYO ELECTRON LTD161 citations98
US10553407B2Feb 4, 2020
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD47 citations97
US6106737AAug 22, 2000
Plasma treatment method utilizing an amplitude-modulated high frequency power
TOKYO ELECTRON LTD66 citations96
US7749914B2Jul 6, 2010
Plasma etching method
TOKYO ELECTRON LTD39 citations93
US7654010B2Feb 2, 2010
Substrate processing system, substrate processing method, and storage medium
TOKYO ELECTRON LTD27 citations93
US6793832B1Sep 21, 2004
Plasma etching method
TOKYO ELECTRON LTD22 citations93
US7625494B2Dec 1, 2009
Plasma etching method and plasma etching unit
TOKYO ELECTRON LTD35 citations92
US7338576B2Mar 4, 2008
Plasma processing device
TOKYO ELECTRON LTD41 citations92
US6391147B2May 21, 2002
Plasma treatment method and apparatus
TOKYO ELECTRON LTD49 citations92
US5539274AJul 23, 1996
Electron beam excited plasma system
TOKYO ELECTRON LTD32 citations91
US5368676ANov 29, 1994
Plasma processing apparatus comprising electron supply chamber and high frequency electric field generation means
TOKYO ELECTRON LTD49 citations89
US7622017B2Nov 24, 2009
Processing apparatus and gas discharge suppressing member
TOKYO ELECTRON LTD8 citations83
US7023002B2Apr 4, 2006
Surface treating device and surface treating method
TOKYO ELECTRON LTD11 citations83
US7473377B2Jan 6, 2009
Plasma processing method
TOKYO ELECTRON LTD14 citations80
US7230202B2Jun 12, 2007
Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
TOKYO ELECTRON LTD9 citations74
US11387077B2Jul 12, 2022
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD3 citations73
US11170979B2Nov 9, 2021
Plasma etching method and plasma etching apparatus
TOKYO ELECTRON LTD4 citations73
US10763126B2Sep 1, 2020
Etching apparatus and etching method
TOKYO ELECTRON LTD2 citations73
US11613432B2Mar 28, 2023
Processing system and method using transporting device facilitating replacement of consumable part
TOKYO ELECTRON LTD2 citations72
US11443924B2Sep 13, 2022
Upper electrode and plasma processing apparatus
TOKYO ELECTRON LTD2 citations72
US9390943B2Jul 12, 2016
Substrate processing apparatus
TOKYO ELECTRON LTD4 citations72
US9978566B2May 22, 2018
Plasma etching method
TOKYO ELECTRON LTD2 citations71
US12154793B2Nov 26, 2024
Etching apparatus and etching method
TOKYO ELECTRON LTD1 citations63
US12033832B2Jul 9, 2024
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations63
US7794616B2Sep 14, 2010
Etching gas, etching method and etching gas evaluation method
TOKYO ELECTRON LTD5 citations63
US7641806B2Jan 5, 2010
Manufacturing method for membrane member
TOKYO ELECTRON LTD6 citations63
US7419613B2Sep 2, 2008
Method and device for plasma-etching organic material film
TOKYO ELECTRON LTD5 citations63
US6365060B1Apr 2, 2002
Method for controlling plasma processor
TOKYO ELECTRON LTD4 citations63
US12537172B2Jan 27, 2026
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US12288676B2Apr 29, 2025
Stage and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US11919032B2Mar 5, 2024
Film forming apparatus and method for manufacturing part having film containing silicon
TOKYO ELECTRON LTD0 citations62
US11699573B2Jul 11, 2023
Plasma processing method
TOKYO ELECTRON LTD0 citations62
US11450515B2Sep 20, 2022
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11107663B2Aug 31, 2021
Plasma processing system and plasma processing method
TOKYO ELECTRON LTD0 citations62
US11043389B2Jun 22, 2021
Substrate processing method
TOKYO ELECTRON LTD0 citations62
US12424424B2Sep 23, 2025
Plasma monitoring system, plasma monitoring method, and monitoring device
TOKYO ELECTRON LTD0 citations61
US12087591B2Sep 10, 2024
Plasma processing apparatus and system
TOKYO ELECTRON LTD1 citations61
US11967487B2Apr 23, 2024
Forming method of component and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11315793B2Apr 26, 2022
Etching method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11152194B2Oct 19, 2021
Plasma processing apparatuses having a dielectric injector
TOKYO ELECTRON LTD0 citations61
OCTEC INC
3 patentsUS7585386B2Sep 8, 2009
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
OCTEC INC33 citations91
US7922862B2Apr 12, 2011
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
OCTEC INC9 citations83
US7470998B2Dec 30, 2008
Semiconductor device and method of manufacturing the same
OCTEC INC6 citations73
TOSHIBA KK
2 patentsNAGAYAMA NOBUYUKI
1 patentShowing the top 50 of 72 patents by PatentIndex Score.