P

Inventor

SAITO MICHISHIGE

JP18 patents
⚠️ This page may combine multiple inventors who share the name “SAITO MICHISHIGE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

16 patents
US7506610B2Mar 24, 2009

Plasma processing apparatus and method

TOKYO ELECTRON LTD15 citations84
US7494561B2Feb 24, 2009

Plasma processing apparatus and method, and electrode plate for plasma processing apparatus

TOKYO ELECTRON LTD12 citations84
US9613837B2Apr 4, 2017

Substrate processing apparatus and maintenance method thereof

TOKYO ELECTRON LTD4 citations71
US11742183B2Aug 29, 2023

Plasma processing apparatus and control method

TOKYO ELECTRON LTD3 citations69
US11532461B2Dec 20, 2022

Substrate processing apparatus

TOKYO ELECTRON LTD2 citations69
US11201034B2Dec 14, 2021

Plasma processing apparatus and control method

TOKYO ELECTRON LTD5 citations69
US6620245B2Sep 16, 2003

Liquid coating apparatus with temperature controlling manifold

TOKYO ELECTRON LTD12 citations69
US12288676B2Apr 29, 2025

Stage and substrate processing apparatus

TOKYO ELECTRON LTD0 citations62
US11919032B2Mar 5, 2024

Film forming apparatus and method for manufacturing part having film containing silicon

TOKYO ELECTRON LTD0 citations62
US11967487B2Apr 23, 2024

Forming method of component and plasma processing apparatus

TOKYO ELECTRON LTD0 citations61
US11515125B2Nov 29, 2022

Upper electrode and plasma processing apparatus

TOKYO ELECTRON LTD0 citations61
US11764040B2Sep 19, 2023

Placing table and substrate processing apparatus

TOKYO ELECTRON LTD0 citations60
US11443922B2Sep 13, 2022

High frequency power supply member and plasma processing apparatus

TOKYO ELECTRON LTD0 citations52
US12494349B2Dec 9, 2025

Member, manufacturing method of member and substrate processing apparatus

TOKYO ELECTRON LTD0 citations51
US12300475B2May 13, 2025

Substrate support and substrate processing apparatus

TOKYO ELECTRON LTD0 citations51
US11981993B2May 14, 2024

Forming method of component and substrate processing system

TOKYO ELECTRON LTD0 citations51

YOSHIDA RYOICHI

1 patent

KOSHIISHI AKIRA

1 patent