Inventor
HAYASE RUMIKO
JP29 patents
Patents
29 patentsUS5965663AOct 12, 1999
Resin composition and resin-molded type semiconductor device
TOSHIBA KK90 citations98
US5403695AApr 4, 1995
Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups
TOSHIBA KK83 citations96
US5326675AJul 5, 1994
Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer
TOSHIBA KK49 citations96
US5658706AAug 19, 1997
Resist composition for forming a pattern comprising a pyridinium compound as an additive
TOSHIBA KK82 citations95
US6437090B1Aug 20, 2002
Curing catalyst, resin composition, resin-sealed semiconductor device and coating material
TOSHIBA KK21 citations92
US6316170B2Nov 13, 2001
Developing solution and method of forming polyimide pattern by using the developing solution
TOSHIBA KK20 citations92
US6071670AJun 6, 2000
Transparent resin, photosensitive composition, and method of forming a pattern
TOSHIBA KK37 citations92
US5998509ADec 7, 1999
Resin composition and semiconductor device employing the same
TOSHIBA KK32 citations92
USRE35821EJun 9, 1998
Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer
TOSHIBA KK23 citations92
US5744281AApr 28, 1998
Resist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additive
TOSHIBA KK34 citations92
US5518864AMay 21, 1996
Method of forming polyimide film pattern
TOSHIBA KK31 citations92
US5348835ASep 20, 1994
Photosensitive resin composition for forming polyimide film pattern comprising an o-quinone diazide photosensitive agent
TOSHIBA KK33 citations92
US5340684AAug 23, 1994
Photosensitive composition and resin-encapsulated semiconductor device
TOSHIBA KK40 citations92
US5100768AMar 31, 1992
Photosensitive composition
TOSHIBA KK34 citations92
US5580702ADec 3, 1996
Method for forming resist patterns
TOSHIBA KK31 citations89
US7254106B2Aug 7, 2007
Method and equipment for storing holographic data
TOSHIBA KK9 citations73
US7593304B2Sep 22, 2009
Apparatus and method for recording and reproducing hologram, and spatial light modulator therefor
TOSHIBA KK6 citations63
US5091282AFeb 25, 1992
Alkali soluble phenol polymer photosensitive composition
TOSHIBA KK4 citations63
US7494747B2Feb 24, 2009
Holographic recording medium
TOSHIBA KK2 citations60
US7601465B2Oct 13, 2009
Holographic recording medium
TOSHIBA KK0 citations52
US10355212B2Jul 16, 2019
Polymer and solar cell using the same
TOSHIBA KK0 citations51
US9634252B2Apr 25, 2017
Polymer and solar cell using the same
TOSHIBA KK0 citations51
US7852537B2Dec 14, 2010
Optical recording medium and method of manufacturing the same
TOSHIBA KK0 citations51
US9865831B2Jan 9, 2018
Polymer, organic thin-film solar cell using the same, and electronic product comprising the cell
TOSHIBA KK0 citations42
US10236322B2Mar 19, 2019
Solar cell module
TOSHIBA KK0 citations41
US9905766B2Feb 27, 2018
Polymer and solar cell using the same
TOSHIBA KK0 citations41
US9818945B2Nov 14, 2017
Polymer and solar cell using the same
TOSHIBA KK0 citations41
US9698349B2Jul 4, 2017
Polymer and solar cell using the same
TOSHIBA KK0 citations41
US7498103B2Mar 3, 2009
Holographic recording medium and method of manufacturing the same
TOSHIBA KK0 citations39