Inventor
OHMORI MASASHI
US18 patents
⚠️ This page may combine multiple inventors who share the name “OHMORI MASASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
13 patentsUS5379785AJan 10, 1995
Cleaning apparatus
MITSUBISHI ELECTRIC CORP91 citations96
US5517027AMay 14, 1996
Method for detecting and examining slightly irregular surface states, scanning probe microscope therefor, and method for fabricating a semiconductor device or a liquid crystal display device using these
MITSUBISHI ELECTRIC CORP55 citations94
US5877035AMar 2, 1999
Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same
MITSUBISHI ELECTRIC CORP29 citations92
US5568821AOct 29, 1996
Semiconductor cleaning apparatus and wafer cassette
MITSUBISHI ELECTRIC CORP21 citations92
US5445171AAug 29, 1995
Semiconductor cleaning apparatus and wafer cassette
MITSUBISHI ELECTRIC CORP27 citations92
US5432601AJul 11, 1995
Fine particle analyzing device
MITSUBISHI ELECTRIC CORP27 citations92
US6715944B2Apr 6, 2004
Apparatus for removing photoresist film
MITSUBISHI ELECTRIC CORP16 citations83
US5383482AJan 24, 1995
Semiconductor processing apparatus and module
MITSUBISHI ELECTRIC CORP17 citations82
US5590672AJan 7, 1997
Semiconductor cleaning apparatus and wafer cassette
MITSUBISHI ELECTRIC CORP9 citations73
US5551459ASep 3, 1996
Semiconductor cleaning apparatus and wafer cassette
MITSUBISHI ELECTRIC CORP10 citations73
US5076207ADec 31, 1991
Apparatus for atmospheric chemical vapor deposition
MITSUBISHI ELECTRIC CORP10 citations73
US5470392ANov 28, 1995
Semiconductor device processing method
MITSUBISHI ELECTRIC CORP4 citations62
US5187118AFeb 16, 1993
Method of manufacturing semiconductor devices
MITSUBISHI ELECTRIC CORP6 citations54
MAZDA MOTOR
2 patentsSEIKO INSTR INC
2 patentsUS6255127B1Jul 3, 2001
Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same
SEIKO INSTR INC20 citations92
US6124142ASep 26, 2000
Method for analyzing minute foreign substance elements
SEIKO INSTR INC27 citations92