P

Inventor

BLEEKER ARNO

NL11 patents
⚠️ This page may combine multiple inventors who share the name “BLEEKER ARNO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML HOLDING NV

10 patents
US7133121B2Nov 7, 2006

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

ASML HOLDING NV13 citations92
US6876440B1Apr 5, 2005

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

ASML HOLDING NV22 citations92
US7061591B2Jun 13, 2006

Maskless lithography systems and methods utilizing spatial light modulator arrays

ASML HOLDING NV24 citations91
US7410736B2Aug 12, 2008

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones

ASML HOLDING NV15 citations83
US7688423B2Mar 30, 2010

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones

ASML HOLDING NV3 citations62
US6989920B2Jan 24, 2006

System and method for dose control in a lithographic system

ASML HOLDING NV2 citations60
US7773199B2Aug 10, 2010

Methods and systems to compensate for a stitching disturbance of a printed pattern

ASML HOLDING NV0 citations51
US7630054B2Dec 8, 2009

Methods and systems to compensate for a stitching disturbance of a printed pattern

ASML HOLDING NV0 citations51
US7274502B2Sep 25, 2007

System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks

ASML HOLDING NV0 citations51
US7403266B2Jul 22, 2008

Maskless lithography systems and methods utilizing spatial light modulator arrays

ASML HOLDING NV1 citations48

MICRONIC LASER SYSTEMS AB

1 patent