Inventor

LATYPOV AZAT

US28 patents

⚠️ This page may combine multiple inventors who share the name “LATYPOV AZAT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LATYPOV AZAT

ASML HOLDING NV

Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation

Method and system for wavefront measurements of an optical system

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation

Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography

Method and system for a maskless lithography rasterization technique based on global optimization

Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography

Methods and systems to compensate for a stitching disturbance of a printed pattern

Methods and systems to compensate for a stitching disturbance of a printed pattern

Methods, systems, and computer program products for printing patterns on photosensitive surfaces

GLOBALFOUNDRIES INC

Methods for directed self-assembly process/proximity correction

Methods for fabricating integrated circuits using designs of integrated circuits adapted to directed self-assembly fabrication to form via and contact structures

Methods for directed self-assembly process/proximity correction

Method and apparatus for providing metric relating two or more process parameters to yield

Methods for fabricating integrated circuits including generating photomasks for directed self-assembly

Methods for fabricating integrated circuits including generating photomasks for directed self-assembly

Methods for fabricating integrated circuits including generating e-beam patterns for directed self-assembly

Methods for fabricating integrated circuits including generating photomasks for directed self-assembly

Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist features

Methods for fabricating integrated circuits including generating photomasks for directed self-assembly (DSA) using DSA target patterns

Shrink process aware assist features

Methods for fabricating integrated circuits including topographical features for directed self-assembly

Methods for fabricating integrated circuits using directed self-assembly including a substantially periodic array of topographical features that includes etch resistant topographical features for transferability control

MENTOR GRAPHICS CORP

Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process

SIEMENS IND SOFTWARE INC

Method and system for calculating printed area metric indicative of stochastic variations of the lithographic process