Inventor

VLADIMIRSKY YULI

US27 patents

⚠️ This page may combine multiple inventors who share the name “VLADIMIRSKY YULI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VLADIMIRSKY YULI

ASML HOLDING NV

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region

Method and system for wavefront measurements of an optical system

Lithographic apparatus having double telecentric illumination

Speckle reduction method and system for EUV interferometry

Compact two-sided reticle inspection system

Lithographic pre-alignment imaging sensor with build-in coaxial illumination

Invariable magnification multilevel optical device with telecentric converter

Lithographic patterning device multichannel position and level gauge

Optical system for transforming numerical aperture

Optical system for transforming numerical aperture

Optical system, inspection system and manufacturing method

Systems and methods for minimizing scattered light in multi-SLM maskless lithography

Systems and methods for minimizing scattered light in multi-SLM maskless lithography

Methods and systems to compensate for a stitching disturbance of a printed pattern

Methods and systems to compensate for a stitching disturbance of a printed pattern

VLADIMIRSKY YULI

Particle detection on an object surface

Lithographic apparatus and device manufacturing method

Thin film continuous spatially modulated grey attenuators and filters

Diffraction elements for alignment targets

UNIV LOUISIANA STATE

Microsystem for rapid DNA sequencing

High aspect ratio microstructures and methods for manufacturing microstructures

IBM

Segmented mask and exposure system for x-ray lithography

X-ray metrology and alignment detection system

UNIV SINGAPORE

Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction

ASML HOLDINGS N V

System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions

RYZHIKOV LEV

Optical system, inspection system and manufacturing method