Inventor
FENZEL-ALEXANDER DEBRA
US5 patents
Patents
5 patentsUS6806026B2Oct 19, 2004
Photoresist composition
IBM62 citations95
US7261992B2Aug 28, 2007
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions
IBM11 citations83
US7135595B2Nov 14, 2006
Photoresist composition
IBM4 citations73
US7014980B2Mar 21, 2006
Photoresist composition
IBM10 citations73
US7550254B2Jun 23, 2009
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions
IBM2 citations62