Inventor
VENTZEK PETER
JP46 patents
⚠️ This page may combine multiple inventors who share the name “VENTZEK PETER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
45 patentsUS10998169B2May 4, 2021
Systems and methods of control for plasma processing
TOKYO ELECTRON LTD44 citations98
US11079682B1Aug 3, 2021
Methods for extreme ultraviolet (EUV) resist patterning development
TOKYO ELECTRON LTD18 citations94
US11295937B2Apr 5, 2022
Broadband plasma processing systems and methods
TOKYO ELECTRON LTD7 citations86
US11342195B1May 24, 2022
Methods for anisotropic etch of silicon-based materials with selectivity to organic materials
TOKYO ELECTRON LTD7 citations85
US11094543B1Aug 17, 2021
Defect correction on metal resists
TOKYO ELECTRON LTD7 citations84
US11430643B2Aug 30, 2022
Quantification of processing chamber species by electron energy sweep
TOKYO ELECTRON LTD7 citations83
US11348761B2May 31, 2022
Impedance matching apparatus and control method
TOKYO ELECTRON LTD4 citations73
US11251021B2Feb 15, 2022
Mode-switching plasma systems and methods of operating thereof
TOKYO ELECTRON LTD2 citations73
US11201035B2Dec 14, 2021
Radical source with contained plasma
TOKYO ELECTRON LTD2 citations73
US11170981B2Nov 9, 2021
Broadband plasma processing systems and methods
TOKYO ELECTRON LTD2 citations73
US11056347B2Jul 6, 2021
Method for dry etching compound materials
TOKYO ELECTRON LTD2 citations73
US11264212B1Mar 1, 2022
Ion angle detector
TOKYO ELECTRON LTD2 citations69
US12394629B2Aug 19, 2025
Plasma processing methods using low frequency bias pulses
TOKYO ELECTRON LTD0 citations62
US12288692B2Apr 29, 2025
Method of forming a FET structure by selective deposition of film on source/drain contact
TOKYO ELECTRON LTD0 citations62
US12230475B2Feb 18, 2025
Systems and methods of control for plasma processing
TOKYO ELECTRON LTD0 citations62
US12189297B2Jan 7, 2025
Methods for extreme ultraviolet (EUV) resist patterning development
TOKYO ELECTRON LTD0 citations62
US12057293B2Aug 6, 2024
Methods for real-time pulse measurement and pulse timing adjustment to control plasma process performance
TOKYO ELECTRON LTD1 citations62
US11915910B2Feb 27, 2024
Fast neutral generation for plasma processing
TOKYO ELECTRON LTD0 citations62
US11830709B2Nov 28, 2023
Broadband plasma processing systems and methods
TOKYO ELECTRON LTD1 citations62
US11688586B2Jun 27, 2023
Method and apparatus for plasma processing
TOKYO ELECTRON LTD1 citations62
US11605539B2Mar 14, 2023
Defect correction on metal resists
TOKYO ELECTRON LTD1 citations62
US11605536B2Mar 14, 2023
Cyclic low temperature film growth processes
TOKYO ELECTRON LTD1 citations62
US11605542B2Mar 14, 2023
Method for dry etching compound materials
TOKYO ELECTRON LTD0 citations62
US11545364B2Jan 3, 2023
Pulsed capacitively coupled plasma processes
TOKYO ELECTRON LTD0 citations62
US11527413B2Dec 13, 2022
Cyclic plasma etch process
TOKYO ELECTRON LTD1 citations62
US11393663B2Jul 19, 2022
Methods and systems for focus ring thickness determinations and feedback control
TOKYO ELECTRON LTD1 citations62
US11257685B2Feb 22, 2022
Apparatus and process for electron beam mediated plasma etch and deposition processes
TOKYO ELECTRON LTD0 citations62
US11183398B2Nov 23, 2021
Ruthenium hard mask process
TOKYO ELECTRON LTD0 citations62
US11158516B2Oct 26, 2021
Plasma processing methods using low frequency bias pulses
TOKYO ELECTRON LTD0 citations62
US11043362B2Jun 22, 2021
Plasma processing apparatuses including multiple electron sources
TOKYO ELECTRON LTD0 citations62
US10910196B1Feb 2, 2021
Mode-switching plasma systems and methods of operating thereof
TOKYO ELECTRON LTD0 citations62
US11152194B2Oct 19, 2021
Plasma processing apparatuses having a dielectric injector
TOKYO ELECTRON LTD0 citations61
US9252001B2Feb 2, 2016
Plasma processing apparatus, plasma processing method and storage medium
TOKYO ELECTRON LTD2 citations61
US9165771B2Oct 20, 2015
Pulsed gas plasma doping method and apparatus
TOKYO ELECTRON LTD3 citations61
US11393662B2Jul 19, 2022
Apparatuses and methods for plasma processing
TOKYO ELECTRON LTD0 citations59
US12131888B2Oct 29, 2024
Gas cluster assisted plasma processing
TOKYO ELECTRON LTD0 citations52
US12014901B2Jun 18, 2024
Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
TOKYO ELECTRON LTD0 citations52
US11817295B2Nov 14, 2023
Three-phase pulsing systems and methods for plasma processing
TOKYO ELECTRON LTD0 citations52
US11521834B2Dec 6, 2022
Plasma processing systems and methods for chemical processing a substrate
TOKYO ELECTRON LTD0 citations52
US11205576B2Dec 21, 2021
Monolayer film mediated precision material etch
TOKYO ELECTRON LTD0 citations52
US11205562B2Dec 21, 2021
Hybrid electron beam and RF plasma system for controlled content of radicals and ions
TOKYO ELECTRON LTD0 citations52
US10340137B2Jul 2, 2019
Monolayer film mediated precision film deposition
TOKYO ELECTRON LTD0 citations52
US9947515B2Apr 17, 2018
Microwave surface-wave plasma device
TOKYO ELECTRON LTD0 citations52
US9793095B2Oct 17, 2017
Microwave surface-wave plasma device
TOKYO ELECTRON LTD0 citations52
US12272520B2Apr 8, 2025
Process control enabled VDC sensor for plasma process
TOKYO ELECTRON LTD0 citations51