P

Inventor

VENTZEK PETER

JP46 patents
⚠️ This page may combine multiple inventors who share the name “VENTZEK PETER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

45 patents
US10998169B2May 4, 2021

Systems and methods of control for plasma processing

TOKYO ELECTRON LTD44 citations98
US11079682B1Aug 3, 2021

Methods for extreme ultraviolet (EUV) resist patterning development

TOKYO ELECTRON LTD18 citations94
US11295937B2Apr 5, 2022

Broadband plasma processing systems and methods

TOKYO ELECTRON LTD7 citations86
US11342195B1May 24, 2022

Methods for anisotropic etch of silicon-based materials with selectivity to organic materials

TOKYO ELECTRON LTD7 citations85
US11094543B1Aug 17, 2021

Defect correction on metal resists

TOKYO ELECTRON LTD7 citations84
US11430643B2Aug 30, 2022

Quantification of processing chamber species by electron energy sweep

TOKYO ELECTRON LTD7 citations83
US11348761B2May 31, 2022

Impedance matching apparatus and control method

TOKYO ELECTRON LTD4 citations73
US11251021B2Feb 15, 2022

Mode-switching plasma systems and methods of operating thereof

TOKYO ELECTRON LTD2 citations73
US11201035B2Dec 14, 2021

Radical source with contained plasma

TOKYO ELECTRON LTD2 citations73
US11170981B2Nov 9, 2021

Broadband plasma processing systems and methods

TOKYO ELECTRON LTD2 citations73
US11056347B2Jul 6, 2021

Method for dry etching compound materials

TOKYO ELECTRON LTD2 citations73
US11264212B1Mar 1, 2022

Ion angle detector

TOKYO ELECTRON LTD2 citations69
US12394629B2Aug 19, 2025

Plasma processing methods using low frequency bias pulses

TOKYO ELECTRON LTD0 citations62
US12288692B2Apr 29, 2025

Method of forming a FET structure by selective deposition of film on source/drain contact

TOKYO ELECTRON LTD0 citations62
US12230475B2Feb 18, 2025

Systems and methods of control for plasma processing

TOKYO ELECTRON LTD0 citations62
US12189297B2Jan 7, 2025

Methods for extreme ultraviolet (EUV) resist patterning development

TOKYO ELECTRON LTD0 citations62
US12057293B2Aug 6, 2024

Methods for real-time pulse measurement and pulse timing adjustment to control plasma process performance

TOKYO ELECTRON LTD1 citations62
US11915910B2Feb 27, 2024

Fast neutral generation for plasma processing

TOKYO ELECTRON LTD0 citations62
US11830709B2Nov 28, 2023

Broadband plasma processing systems and methods

TOKYO ELECTRON LTD1 citations62
US11688586B2Jun 27, 2023

Method and apparatus for plasma processing

TOKYO ELECTRON LTD1 citations62
US11605539B2Mar 14, 2023

Defect correction on metal resists

TOKYO ELECTRON LTD1 citations62
US11605536B2Mar 14, 2023

Cyclic low temperature film growth processes

TOKYO ELECTRON LTD1 citations62
US11605542B2Mar 14, 2023

Method for dry etching compound materials

TOKYO ELECTRON LTD0 citations62
US11545364B2Jan 3, 2023

Pulsed capacitively coupled plasma processes

TOKYO ELECTRON LTD0 citations62
US11527413B2Dec 13, 2022

Cyclic plasma etch process

TOKYO ELECTRON LTD1 citations62
US11393663B2Jul 19, 2022

Methods and systems for focus ring thickness determinations and feedback control

TOKYO ELECTRON LTD1 citations62
US11257685B2Feb 22, 2022

Apparatus and process for electron beam mediated plasma etch and deposition processes

TOKYO ELECTRON LTD0 citations62
US11183398B2Nov 23, 2021

Ruthenium hard mask process

TOKYO ELECTRON LTD0 citations62
US11158516B2Oct 26, 2021

Plasma processing methods using low frequency bias pulses

TOKYO ELECTRON LTD0 citations62
US11043362B2Jun 22, 2021

Plasma processing apparatuses including multiple electron sources

TOKYO ELECTRON LTD0 citations62
US10910196B1Feb 2, 2021

Mode-switching plasma systems and methods of operating thereof

TOKYO ELECTRON LTD0 citations62
US11152194B2Oct 19, 2021

Plasma processing apparatuses having a dielectric injector

TOKYO ELECTRON LTD0 citations61
US9252001B2Feb 2, 2016

Plasma processing apparatus, plasma processing method and storage medium

TOKYO ELECTRON LTD2 citations61
US9165771B2Oct 20, 2015

Pulsed gas plasma doping method and apparatus

TOKYO ELECTRON LTD3 citations61
US11393662B2Jul 19, 2022

Apparatuses and methods for plasma processing

TOKYO ELECTRON LTD0 citations59
US12131888B2Oct 29, 2024

Gas cluster assisted plasma processing

TOKYO ELECTRON LTD0 citations52
US12014901B2Jun 18, 2024

Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma

TOKYO ELECTRON LTD0 citations52
US11817295B2Nov 14, 2023

Three-phase pulsing systems and methods for plasma processing

TOKYO ELECTRON LTD0 citations52
US11521834B2Dec 6, 2022

Plasma processing systems and methods for chemical processing a substrate

TOKYO ELECTRON LTD0 citations52
US11205576B2Dec 21, 2021

Monolayer film mediated precision material etch

TOKYO ELECTRON LTD0 citations52
US11205562B2Dec 21, 2021

Hybrid electron beam and RF plasma system for controlled content of radicals and ions

TOKYO ELECTRON LTD0 citations52
US10340137B2Jul 2, 2019

Monolayer film mediated precision film deposition

TOKYO ELECTRON LTD0 citations52
US9947515B2Apr 17, 2018

Microwave surface-wave plasma device

TOKYO ELECTRON LTD0 citations52
US9793095B2Oct 17, 2017

Microwave surface-wave plasma device

TOKYO ELECTRON LTD0 citations52
US12272520B2Apr 8, 2025

Process control enabled VDC sensor for plasma process

TOKYO ELECTRON LTD0 citations51

SAWADA IKUO

1 patent