Inventor
ONISHI SHIGEO
JP33 patents
⚠️ This page may combine multiple inventors who share the name “ONISHI SHIGEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHARP KK
30 patentsUS5965942AOct 12, 1999
Semiconductor memory device with amorphous diffusion barrier between capacitor and plug
SHARP KK67 citations96
US5854104ADec 29, 1998
Process for fabricating nonvolatile semiconductor memory device having a ferroelectric capacitor
SHARP KK81 citations96
US5708284AJan 13, 1998
Non-volatile random access memory
SHARP KK68 citations96
US5638319AJun 10, 1997
Non-volatile random access memory and fabrication method thereof
SHARP KK88 citations96
US5515984AMay 14, 1996
Method for etching PT film
SHARP KK70 citations96
US5416735AMay 16, 1995
Non-volatile random access memory with ferroelectric capacitor
SHARP KK59 citations96
US5414654AMay 9, 1995
Driving circuit of a ferroelectric memory device and a method for driving the same
SHARP KK84 citations96
US5049970ASep 17, 1991
High resistive element
SHARP KK66 citations96
US5858851AJan 12, 1999
Manufacturing method of electrode
SHARP KK53 citations95
US5397446AMar 14, 1995
Method of forming a ferroelectric film
SHARP KK40 citations93
US5357460AOct 18, 1994
Semiconductor memory device having two transistors and at least one ferroelectric film capacitor
SHARP KK39 citations92
US5293075AMar 8, 1994
Semiconductor device with PZT/PLZT film and lead-containing electrode
SHARP KK29 citations92
US5200361AApr 6, 1993
Process for preparing a semiconductor device using hydrogen fluoride and nitrogen to remove deposits
SHARP KK24 citations92
US5183770AFeb 2, 1993
Semiconductor device
SHARP KK25 citations91
US5059550AOct 22, 1991
Method of forming an element isolating portion in a semiconductor device
SHARP KK39 citations91
US4916087AApr 10, 1990
Method of manufacturing a semiconductor device by filling and planarizing narrow and wide trenches
SHARP KK49 citations91
US5776356AJul 7, 1998
Method for etching ferroelectric film
SHARP KK24 citations90
US5183782AFeb 2, 1993
Process for fabricating a semiconductor device including a tungsten silicide adhesive layer
SHARP KK25 citations90
US5312774AMay 17, 1994
Method for manufacturing a semiconductor device comprising titanium
SHARP KK39 citations88
US5443030AAug 22, 1995
Crystallizing method of ferroelectric film
SHARP KK19 citations80
US5414653AMay 9, 1995
Non-volatile random access memory having a high load device
SHARP KK13 citations74
US5383151AJan 17, 1995
Dynamic random access memory
SHARP KK15 citations74
US5139964AAug 18, 1992
Method for forming isolation region of semiconductor device
SHARP KK10 citations74
US5420079AMay 30, 1995
Process for producing semiconductor device comprising two step annealing treatment
SHARP KK8 citations73
US5322810AJun 21, 1994
Method for manufacturing a semiconductor device
SHARP KK5 citations73
US5298446AMar 29, 1994
Process for producing semiconductor device
SHARP KK14 citations73
US5217912AJun 8, 1993
Method for manufacturing a semiconductor device
SHARP KK7 citations73
US5348900ASep 20, 1994
Process for manufacturing a semiconductor device including heat treatment in ammonia or oxygen
SHARP KK11 citations72
US6881643B2Apr 19, 2005
Semiconductor device producing method and semiconductor device
SHARP KK3 citations63
US5379718AJan 10, 1995
Method for forming a titanium thin film
SHARP KK3 citations63